Ferroelectricity In Doped Hafnium Oxide Materials Properties And Devices 2

Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. - Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices - Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more - Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face

This dissertation investigates the phenomenon of negative capacitance in ferroelectric materials, which is promising for overcoming the fundamental limits of energy efficiency in electronics. The focus of this dissertation is on negative capacitance in hafnium oxide based ferroelectrics and the impact of ferroelectric domain formation.

Memristive Devices for Brain-Inspired Computing: From Materials, Devices, and Circuits to Applications—Computational Memory, Deep Learning, and Spiking Neural Networks reviews the latest in material and devices engineering for optimizing memristive devices beyond storage applications and toward brain-inspired computing. The book provides readers with an understanding of four key concepts, including materials and device aspects with a view of current materials systems and their remaining barriers, algorithmic aspects comprising basic concepts of neuroscience as well as various computing concepts, the circuits and architectures implementing those algorithms based on memristive technologies, and target applications, including brain-inspired computing, computational memory, and deep learning. This comprehensive book is suitable for an interdisciplinary audience, including materials scientists, physicists, electrical engineers, and computer scientists. - Provides readers an overview of four key concepts in this emerging research topic including materials and device aspects, algorithmic aspects, circuits and architectures and target applications - Covers a broad range of applications, including brain-inspired computing, computational memory, deep learning and spiking neural networks - Includes perspectives from a wide range of disciplines, including materials science, electrical engineering and computing, providing a unique interdisciplinary look at the field

FERROIC MATERIALS-BASED TECHNOLOGIES The book addresses the prospective, relevant, and original research developments in the ferroelectric, magnetic, and multiferroic fields. Ferroic materials have sparked widespread attention because they represent a broad spectrum of elementary physics and are employed in a plethora of fields, including flexible memory, enormous energy harvesting/storage, spintronic functionalities, spin caloritronics, and a large range of other multi-functional devices. With the application of new ferroic materials, strong room-temperature ferroelectricity with high saturation polarization may be established in ferroelectric materials, and magnetism with significant magnetization can be accomplished in magnetic materials. Furthermore, magnetoelectric interaction between ferroelectric and magnetic orderings is high in multiferroic materials, which could enable a wide range of innovative devices. Magnetic, ferroelectric, and multiferroic 2D materials with ultrathin characteristics above ambient temperature are often expected to enable future miniaturization of electronics beyond Moore’s law for energy-efficient nanodevices. This book addresses the prospective, relevant, and original research developments in the ferroelectric, magnetic, and multiferroic fields. Audience The book will interest materials scientists, physicists, and engineers working in ferroic and multiferroic materials.

This book provides comprehensive coverage of the materials characteristics, process technologies, and device operations for memory field-effect transistors employing inorganic or organic ferroelectric thin films. This transistor-type ferroelectric memory has interesting fundamental device physics and potentially large industrial impact. Among various applications of ferroelectric thin films, the development of nonvolatile ferroelectric random access memory (FeRAM) has been most actively progressed since the late 1980s and reached modest mass production for specific application since 1995. There are two types of memory cells in ferroelectric nonvolatile memories. One is the capacitor-type FeRAM and the other is the field-effect transistor (FET)-type FeRAM. Although the FET-type FeRAM claims the ultimate scalability and nondestructive readout characteristics, the capacitor-type FeRAMs have been the main interest for the major semiconductor memory companies, because the ferroelectric FET has fatal handicaps of cross-talk for random accessibility and short retention time. This book aims to provide the readers with development history, technical issues, fabrication methodologies, and promising applications of FET-type ferroelectric memory devices, presenting a comprehensive review of past, present, and future technologies. The topics discussed will lead to further advances in large-area electronics implemented on glass, plastic or paper substrates as well as in conventional Si electronics. The book is composed of chapters written by leading researchers in ferroelectric materials and related device technologies, including oxide and organic ferroelectric thin films.

As data processing and storage needs continue to grow at a rapid pace, the development of innovative memory technologies is crucial. The discovery of ferroelectricity in hafnia (HfO2)-based materials has garnered significant attention in both academia and industry, owing to their potential to revolutionize non-volatile memory (NVM) technology and enable novel computing architectures. HfO2-based ferroelectric materials offer advantages over conventional perovskite oxides, such as low-temperature synthesis and conformal growth in three-dimensional structures on silicon, making them compatible with complementary metal-oxide-semiconductor (CMOS) technology and ideal for device scaling. However, several challenges still exist for implementing ferroelectric HfO2 in commercial products, such as polarization variation during cycling (wake-up effect), high operation voltage, compatibility with back-end-of-line (BEOL) processing temperatures, and low memory density. In this dissertation, I tackled the challenges outlined above. I began by focusing on the Hf0.5Zr0.5O2 (HZO) material itself and addressing the wake-up effect through the introduction of an HfO2 buffer layer at the HZO/electrode interface. Subsequently, I developed a new measurement setup capable of directly measuring individual nm-sized devices, which enabled investigating the scaling effect in HZO-based ferroelectric capacitors. Through my research, I was able to demonstrate excellent ferroelectricity and reliability in ultra-thin HZO (4 nm) capacitors with molybdenum (Mo) electrodes. These capacitors exhibited low operation voltage, wake-up-free behavior, high endurance, and low RTA temperatures, making them highly desirable for practical applications. I also studied the size scaling effect down to 65 nm × 45 nm devices, where I observed ultra-high remanent polarization (2Pr) for the first time at this scale. In addition to exploring two-dimensional scaling to improve density, I also proposed a hybrid structure for 4 bits/cell storage, increasing the multi-bit capability in a single cell.

This book covers the fundamentals and significance of 2-D materials and related semiconductor transistor technologies for the next-generation ultra low power applications. It provides comprehensive coverage on advanced low power transistors such as NCFETs, FinFETs, TFETs, and flexible transistors for future ultra low power applications owing to their better subthreshold swing and scalability. In addition, the text examines the use of field-effect transistors for biosensing applications and covers design considerations and compact modeling of advanced low power transistors such as NCFETs, FinFETs, and TFETs. TCAD simulation examples are also provided. FEATURES Discusses the latest updates in the field of ultra low power semiconductor transistors Provides both experimental and analytical solutions for TFETs and NCFETs Presents synthesis and fabrication processes for FinFETs Reviews details on 2-D materials and 2-D transistors Explores the application of FETs for biosensing in the healthcare field This book is aimed at researchers, professionals, and graduate students in electrical engineering, electronics and communication engineering, electron devices, nanoelectronics and nanotechnology, microelectronics, and solid-state circuits.

The Electrocaloric Effect: Materials and Applications reviews the fundamentals of the electrocaloric effect, the most relevant electrocaloric materials, and electrocaloric measurements and device applications. The book introduces the electrocaloric effect, along with modeling and simulations of this effect. Then, it addresses the latest advances in synthesis, characterization and optimization of the most relevant electrocaloric materials, including ferroelectric materials, liquid materials, lead-free materials, polymers and composites. Finally, there is a review of the latest techniques in measurement and applications in refrigeration and cooling and a discussion of the advantages, challenges and perspectives of the future of electrocaloric refrigeration. - Provides a comprehensive introduction to the electrocaloric effect including experimental techniques to measure, model, and simulate the effect - Reviews the most relevant electrocaloric materials such as composites, polymers, metal oxides, ferroelectric materials, and more - Touches on the design and application of electrocaloric materials for devices with potential cooling and refrigeration applications