Characterization And Metrology For Ulsi Technology 1998 International Conference 23 27 March 1998

The proceedings of the 1998 International Conference on Characterization and Metrology for ULSI Technology was dedicated to summarizing major issues and giving critical reviews of important semiconductor techniques that are crucial to continue the advances in semiconductor technology. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This is the only book that we know of that emphasizes the science and technology of semiconductor characterization in the factory environment. The increasing importance of monitoring and controlling semiconductor processes make it particularly timely.

The Electronic Device Failure Analysis Society proudly announces the Seventh Edition of the Microelectronics Failure Analysis Desk Reference, published by ASM International. The new edition will help engineers improve their ability to verify, isolate, uncover, and identify the root cause of failures. Prepared by a team of experts, this updated reference offers the latest information on advanced failure analysis tools and techniques, illustrated with numerous real-life examples. This book is geared to practicing engineers and for studies in the major area of power plant engineering. For non-metallurgists, a chapter has been devoted to the basics of material science, metallurgy of steels, heat treatment, and structure-property correlation. A chapter on materials for boiler tubes covers composition and application of different grades of steels and high temperature alloys currently in use as boiler tubes and future materials to be used in supercritical, ultra-supercritical and advanced ultra-supercritical thermal power plants. A comprehensive discussion on different mechanisms of boiler tube failure is the heart of the book. Additional chapters detailing the role of advanced material characterization techniques in failure investigation and the role of water chemistry in tube failures are key contributions to the book.

In recent decades scientists and engineers around the globe have been responding to the requirement of high performance materials through innovative material research and engineering. The ever increasing demand on quality and reliability has resulted in some dazzling technological achievements in the area of advanced materials and manufacturing. The purpose of this book is to bring together significant findings of leading experts, in developing and improving the technology that supports advanced materials and process development. From gold nano-structures to advanced superalloys, this book covers investigations involving modern computer based approaches as well as traditional experimental techniques. Selected articles include research findings on advances made in materials that are used not only in complex structures such as aeroplanes but also in clinical treatments. It is envisaged that it will promote knowledge transfer across the materials society including university students, engineers and scientists to built further understanding of the subject.

Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.