Ellipsometry In The Measurement Of Surfaces And Thin Films

Ellipsometry is the method of choice to determine the properties of surfaces and thin films. It provides comprehensive and sensitive characterization in contactless and non-invasive measurements. This book gives a state-of-the-art survey of ellipsometric investigations of organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. In conjunction with the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices and fabrication advances, the ellipsometric analysis of their optical and material properties has progressed rapidly in the recent years.

Excerpt from Ellipsometry in the Measurement of Surfaces and Thin Films: Symposium Proceedings, Washington 1963; Symposium Held September 5-6, 1963, at the National Bureau of Standards, Washington, D. C Although the theory and equations of Drude are exact, the exact equations are cumbersome in form. 'they cannot be solved in closed form for the desired quantities (refractive index and thickness of film) in terms of the measured change in state of polarization, as represented by tan ill, the ratio of the magnitude of the reflection coefficient for light polarized in the plane of incidence to that polarized normal to the plane of incidence, and A, the relative phase difference for these two polarizations. Thus trial-and-error and iteration meth ods must be used, and before the availability of electronic computers the routine application of the exact equations was almost impossible. Thus Drude and many subsequent workers used only the first linear terms in the expansion of the equations relating tangb and A to refrac tive index and thickness, and it is these approximate equations which are (unfortunately) often referred to as the Drude equations. This limited the application of the Drude theory to films which are very thin in comparison to the wavelength of light. However, With modern electronic computers the use of the exact equations is routine, once the initial programming is complete. Most workers have some kind of computational facilities, and programs have been described by Archer [2] and mccrackin et al. About the Publisher Forgotten Books publishes hundreds of thousands of rare and classic books. Find more at www.forgottenbooks.com This book is a reproduction of an important historical work. Forgotten Books uses state-of-the-art technology to digitally reconstruct the work, preserving the original format whilst repairing imperfections present in the aged copy. In rare cases, an imperfection in the original, such as a blemish or missing page, may be replicated in our edition. We do, however, repair the vast majority of imperfections successfully; any imperfections that remain are intentionally left to preserve the state of such historical works.

This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.

Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

This book is a conceptual overview of surface and thin film science, providing a basic and straightforward understanding of the most common ideas and methods used in these fields. Fundamental scientific ideas, deposition methods, and characterization methods are all examined. Relying on simple, conceptual models and figures, fundamental scientific ideas are introduced and then applied to surfaces and thin films in the first half of the book. Topics include vacuum and plasma environments, crystal structure, atomic motion, thermodynamics, electrical and magnetic properties, optical and thermal properties, and adsorbed atoms on surfaces. Common methods of gas-phase thin film deposition are then introduced, starting with an overview of the film growth process and then a discussion of both physical and chemical vapor deposition methods. This is followed by an overview of a wide range of characterization techniques including imaging, structural, chemical, electrical, magnetic, optical, thermal, and mechanical techniques. Thin film science is a natural extension of surface science, especially as applications involve thinner and thinner films; distinct from other literature in the field, this book combines the two topics in a single volume. Simple, conceptual models and figures are used, supported by some mathematical expressions, to convey key ideas to students as well as practicing engineers, scientists, and technicians.