Handbook Of Vlsi Microlithography

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.

The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.

WINNER OF THE 2001 KRASZNA-KRAUSZ PHOTOGRAPHY BOOK AWARD (Technical Photography category) The only definitive book to fully encompass the use of photography and imaging as tools in science, technology and medicine. It describes in one single volume the basic theory, techniques, materials, special equipment and applications for a wide variety of uses of photography, including: close up photography and photomacrography to spectral recording, surveillance systems, radiography and micro-imaging. This extensively illustrated photography 'bible' contains all the information you need, whether you are a scientist wishing to use photography for a specialist application, a professional needing to extend technical expertise, or a student wanting to broaden your knowledge of the applications of photography. The contents are arranged in three sections: · General Section, detailing the elements of the image capture process · Major Applications, describing the major applications of imaging · Specialist Applications, presenting an eclectic selection of more specialised but increasingly important applications Each subject is introduced with an outline of its development and contemporary importance, followed by explanations of essential theory and an overview of techniques and equipment. Mathematics is only used where necessary. Numerous applications and case studies are described. Comprehensive bibliographies and references are provided for further study.

A Fully Integrated Presentation of New Hardware and Software Product Introductions Using Program Management Methodologies for System on Chip Platforms If you're an executive, manager, or engineer in the semiconductor, software, or systems industries, this book provides conceptual views ranging from the design of integrated circuits or systems on a chip, through fabrication, to integration of chips onto boards, and through development of enablement and runtime software for system and platform deliveries. Special features included this book are: - Program management methodologies - General management fundamentals - An overview of leadership principles - Basic discrete device technology - Internal structure and operation of some common logic gates - Basic integrated circuit design concepts, building blocks, and flow - Chip packaging technologies - Details of the fabrication process for integrated circuits - Printed circuit board design, manufacture, and test - Software design, development, and test - Integrated circuit test, silicon validation, and device qualification - Program management applications bringing it all together The book explores interactions and dependencies of technologies that impact systems and platforms. This is a valuable resource to learn these technologies or to use as a reference.

This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.