High Density Helicon Plasma Science

This book highlights a high-density helicon plasma source produced by radio frequency excitation in the presence of magnetic fields, which has attracted considerable attention thanks to its wide applicability in various fields, from basic science to industrial use. Presenting specific applications such as plasma thrusters, nuclear fusion, and plasma processing, it offers a review of modern helicon plasma science for a broad readership. The book covers a wide range of topics, including the fundamental physics of helicon plasma and their cutting-edge applications, based on his abundant and broad experience from low to high temperature plasmas, using various linear magnetized machines and nuclear fusion ones such as tokamaks and reversed field pinches. It first provides a brief overview of the field and a crash course on the fundamentals of plasma, including miscellaneous diagnostics, for advanced undergraduate and early graduate students in plasma science, and presents the basics of helicon plasma for beginners in the field. Further, digesting advanced application topics is also useful for experts to have a quick overview of extensive helicon plasma science research.

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

In this new book, an interdisciplinary and international team of experts provides an exploration of the emerging plasma science that is poised to make the plasma technology a reality in the manufacturing sector. The research presented here will stimulate new ideas, methods, and applications in the field of plasma science and nanotechnology. Plasma technology applications are being developed that could impact the global market for power, electronics, mineral, and other fuel commodities. Currently, plasma science is described as a revolutionary discipline in terms of its possible impact on industrial applications. It offers potential solutions to many problems using emerging techniques. In this book the authors provide a broad overview of recent trends in field plasma science and nanotechnology. Divided into several parts, Plasma and Fusion Science: From Fundamental Research to Technological Applications explores some basic plasma applications and research, space and atmospheric plasma, nuclear fusion, and laser plasma and industrial applications of plasma. A wide variety of cutting-edge topics are covered, including: • basic plasma physics • computer modeling for plasma • exotic plasma (including dusty plasma) • industrial plasma applications • laser plasma • nuclear fusion technology • plasma diagnostics • plasma processing • pulsed power • space astrophysical plasma • plasma and nanotechnology Pointing to current and possible future developments in plasma science and technology, the diverse research presented here will be valuable for researchers, scientists, industry professionals, and others involved in the revolutionary field of plasma and fusion science.

Issues in Nuclear and Plasma Science and Technology: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Nuclear and Plasma Science and Technology. The editors have built Issues in Nuclear and Plasma Science and Technology: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Nuclear and Plasma Science and Technology in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Issues in Nuclear and Plasma Science and Technology: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.

The book presents fundamentals of plasma physics with rich references and computational techniques in a concise manner. It particularly focuses on introductions to numerical simulation methods in plasma physics, in addition to those to physics and mathematics in plasma physics. It also presents the fundamentals of numerical methods, which solve mathematical models of plasmas, together with examples of numerical results. A discretization method, the so-called finite difference method, is introduced for particle-in-cell methods and fluid codes, which have been widely employed in plasma physics studies. In addition to the introduction to numerical solutions, it also covers numerical stability. The instabilities and numerical errors significantly influence the results, and for correct results, great efforts are required to avoid such numerical artifacts. The book also carefully discusses the numerical errors, numerical stability, and uncertainty in numerical computations. Readers are expected to have an understanding of fundamental physics of mechanics, electromagnetism, thermodynamics, statistical physics, relativity, fluid dynamics, and mathematics, but the book does not assume background knowledge on plasma. Therefore, it is a first book of plasma physics for upper undergraduate and early graduate students who are interested in learning it.

This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.

As part of its current physics decadal survey, Physics 2010, the NRC was asked by the DOE, NSF, and NASA to carry out an assessment of and outlook for the broad field of plasma science and engineering over the next several years. The study was to focus on progress in plasma research, identify the most compelling new scientific opportunities, evaluate prospects for broader application of plasmas, and offer guidance to realize these opportunities. The study paid particular attention to these last two points. This "demand-side" perspective provided a clear look at what plasma research can do to help achieve national goals of fusion energy, economic competitiveness, and nuclear weapons stockpile stewardship. The report provides an examination of the broad themes that frame plasma research: low-temperature plasma science and engineering; plasma physics at high energy density; plasma science of magnetic fusion; space and astrophysical science; and basic plasma science. Within those themes, the report offers a bold vision for future developments in plasma science.

Plasma Science and Technology An accessible introduction to the fundamentals of plasma science and its applications In Plasma Science and Technology: Lectures in Physics, Chemistry, Biology, and Engineering, distinguished researcher Dr. Alexander Fridman delivers a comprehensive introduction to plasma technology, including fulsome descriptions of the fundamentals of plasmas and discharges. The author discusses a wide variety of practical applications of the technology to medicine, energy, catalysis, coatings, and more, emphasizing engineering and science fundamentals. Offering readers illuminating problems and concept questions to support understanding and self-study, the book also details organic and inorganic applications of plasma technologies, demonstrating its use in nature, in the lab, and in both novel and well-known applications. Readers will also find: A thorough introduction to the kinetics of excited atoms and molecules Comprehensive explorations of non-equilibrium atmospheric pressure cold discharges Practical discussions of plasma processing in microelectronics and other micro-technologies Expert treatments of plasma in environmental control technologies, including the cleaning of air, exhaust gases, water, and soil Perfect for students of chemical engineering, physics, and chemistry, Plasma Science and Technology will also benefit professionals working in these fields who seek a contemporary refresher in the fundamentals of plasma science and its applications.