Introduction To Metrology Applications In Ic Manufacturing

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy.

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had a book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. The accompanying CD includes example spreadsheets of measurement uncertainty analysis—specifically, precision, matching, and relative accuracy.

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay

Metrology and Instrumentation: Practical Applications for Engineering and Manufacturing provides students and professionals with an accessible foundation in the metrology techniques, instruments, and governing standards used in mechanical engineering and manufacturing. The book opens with an overview of metrology units and scale, then moves on to explain topics such as sources of error, calibration systems, uncertainty, and dimensional, mechanical, and thermodynamic measurement systems. A chapter on tolerance stack-ups covers GD&T, ASME Y14.5-2018, and the ISO standard for general tolerances, while a chapter on digital measurements connects metrology to newer, Industry 4.0 applications.

Thoroughly Revised, State-of-the-Art Semiconductor Design, Manufacturing, and Operations Information Written by 70 international experts and reviewed by a seasoned technical advisory board, this fully updated resource clearly explains the cutting-edge processes used in the design and fabrication of IC chips, MEMS, sensors, and other electronic devices. Semiconductor Manufacturing Handbook, Second Edition, covers the emerging technologies that enable the Internet of Things, the Industrial Internet of Things, data analytics, artificial intelligence, augmented reality, and and smart manufacturing. You will get complete details on semiconductor fundamentals, front- and back-end processes, nanotechnology, photovoltaics, gases and chemicals, fab yield, and operations and facilities. •Nanotechnology and microsystems manufacturing •FinFET and nanoscale silicide formation •Physical design for high-performance, low-power 3D circuits •Epitaxi, anneals, RTP, and oxidation •Microlithography, etching, and ion implantations •Physical, chemical, electrochemical, and atomic layer vapor deposition •Chemical mechanical planarization •Atomic force metrology •Packaging, bonding, and interconnects •Flexible hybrid electronics •Flat-panel,flexible display electronics, and photovoltaics •Gas distribution systems •Ultrapure water and filtration •Process chemicals handling and abatement •Chemical and slurry handling systems •Yield management, CIM, and factory automation •Manufacturing execution systems •Advanced process control •Airborne molecular contamination •ESD controls in clean-room environments •Vacuum systems and RF plasma systems •IC manufacturing parts cleaning technology •Vibration and noise design •And much more