Principles Of Plasma Spectroscopy

This monograph presents a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. The first three chapters introduce the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects. The next chapter describes theoretical and experimental aspects of spectral line broadening. The following five chapters are concerned with continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The book concludes with three chapters covering the basics of various applications of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation. This will be an important text and reference for all those working on plasmas in physics, optics, nuclear engineering, and chemistry, as well as astronomy, astrophysics and space physics.

The book provides an up-to-date account of inductively coupled plasmas and their use in atomic emission spectroscopy and mass spectrometry. Specific applications of the use of these techniques are highlighted including applications in environmental, food and industrial analysis. It is written in a distance learning / open learning style; suitable for self study applications. It contains contain self-assessment and discussion questions, worked examples and case studies that allow the reader to test their understanding of the presented material.

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.

Plasma Physics

This book provides a systematic introduction to the physics behind measurements on plasmas. It develops from first principles the concepts needed to plan, execute, and interpret plasma diagnostics. The book is therefore accessible to graduate students and professionals with little specific plasma physics background, but is also a valuable reference for seasoned plasma physicists. Most of the examples are taken from laboratory plasma research, but the focus on principles makes the treatment useful to all experimental and theoretical plasma physicists, including those interested in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field. Specific areas of added coverage include neutral-beam-based diagnostics, flow measurement with mach probes, equilibrium of strongly shaped plasmas and fusion product diagnostics.

Plasma Spectroscopy develops the foundation of spectroscopy for plasmas containing quasi-monochromatic electric fields in the microwaves or optical range. This topic is of major importance for plasma spectroscopy and the diagnostic of technological microwave and radiofrequency discharges, plasma lasers of microwave, optical, and x-ray ranges, pulsed discharges employed as advanced radiation sources, magnetic and laser fusion, and ionospheric and astrophysical plasmas. This monograph presents novel nonlinear-optical methods for theoretical analysis of radiation of quantum systems in media, describes principles for measuring the field and plasma parameters, and discusses their practical applications.