Run To Run Control For Wafer Patterning In Semiconductor Manufacturing

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.

At publication, The Control Handbook immediately became the definitive resource that engineers working with modern control systems required. Among its many accolades, that first edition was cited by the AAP as the Best Engineering Handbook of 1996. Now, 15 years later, William Levine has once again compiled the most comprehensive and authoritative resource on control engineering. He has fully reorganized the text to reflect the technical advances achieved since the last edition and has expanded its contents to include the multidisciplinary perspective that is making control engineering a critical component in so many fields. Now expanded from one to three volumes, The Control Handbook, Second Edition organizes cutting-edge contributions from more than 200 leading experts. The second volume, Control System Applications, includes 35 entirely new applications organized by subject area. Covering the design and use of control systems, this volume includes applications for: Automobiles, including PEM fuel cells Aerospace Industrial control of machines and processes Biomedical uses, including robotic surgery and drug discovery and development Electronics and communication networks Other applications are included in a section that reflects the multidisciplinary nature of control system work. These include applications for the construction of financial portfolios, earthquake response control for civil structures, quantum estimation and control, and the modeling and control of air conditioning and refrigeration systems. As with the first edition, the new edition not only stands as a record of accomplishment in control engineering but provides researchers with the means to make further advances. Progressively organized, the other two volumes in the set include: Control System Fundamentals Control System Advanced Methods

At publication, The Control Handbook immediately became the definitive resource that engineers working with modern control systems required. Among its many accolades, that first edition was cited by the AAP as the Best Engineering Handbook of 1996. Now, 15 years later, William Levine has once again compiled the most comprehensive and authoritative resource on control engineering. He has fully reorganized the text to reflect the technical advances achieved since the last edition and has expanded its contents to include the multidisciplinary perspective that is making control engineering a critical component in so many fields. Now expanded from one to three volumes, The Control Handbook, Second Edition brilliantly organizes cutting-edge contributions from more than 200 leading experts representing every corner of the globe. They cover everything from basic closed-loop systems to multi-agent adaptive systems and from the control of electric motors to the control of complex networks. Progressively organized, the three volume set includes: Control System Fundamentals Control System Applications Control System Advanced Methods Any practicing engineer, student, or researcher working in fields as diverse as electronics, aeronautics, or biomedicine will find this handbook to be a time-saving resource filled with invaluable formulas, models, methods, and innovative thinking. In fact, any physicist, biologist, mathematician, or researcher in any number of fields developing or improving products and systems will find the answers and ideas they need. As with the first edition, the new edition not only stands as a record of accomplishment in control engineering but provides researchers with the means to make further advances.

This volume presents some recent and principal developments related to computational intelligence and optimization methods in control. Theoretical aspects and practical applications of control engineering are covered by 14 self-contained contributions. Additional gems include the discussion of future directions and research perspectives designed to add to the reader’s understanding of both the challenges faced in control engineering and the insights into the developing of new techniques. With the knowledge obtained, readers are encouraged to determine the appropriate control method for specific applications.

Data Mining for Design and Manufacturing: Methods and Applications is the first book that brings together research and applications for data mining within design and manufacturing. The aim of the book is 1) to clarify the integration of data mining in engineering design and manufacturing, 2) to present a wide range of domains to which data mining can be applied, 3) to demonstrate the essential need for symbiotic collaboration of expertise in design and manufacturing, data mining, and information technology, and 4) to illustrate how to overcome central problems in design and manufacturing environments. The book also presents formal tools required to extract valuable information from design and manufacturing data, and facilitates interdisciplinary problem solving for enhanced decision making. Audience: The book is aimed at both academic and practising audiences. It can serve as a reference or textbook for senior or graduate level students in Engineering, Computer, and Management Sciences who are interested in data mining technologies. The book will be useful for practitioners interested in utilizing data mining techniques in design and manufacturing as well as for computer software developers engaged in developing data mining tools.