Self Diffusion And Impurity Diffusion In Pure Metals Handbook Of Experimental Data
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Self diffusion and Impurity Diffusion in Pure Metals
Author | : Gerhard Neumann,Cornelis Tuijn |
Publsiher | : Elsevier |
Total Pages | : 360 |
Release | : 2011-08-19 |
Genre | : Technology & Engineering |
ISBN | : 0080560040 |
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Diffusion in metals is an important phenomenon, which has many applications, for example in all kinds of steel and aluminum production, and in alloy formation (technical applications e.g. in superconductivity and semiconductor science). In this book the data on diffusion in metals are shown, both in graphs and in equations. Reliable data on diffusion in metals are required by researchers who try to make sense of results from all kinds of metallurgical experiments, and they are equally needed by theorists and computer modelers. The previous compilation dates from 1990, and measurements relying on the electron microprobe and the recent Rutherford backscattering technique were hardly taken into account there. This reference book, containing all results on self-diffusion and impurity diffusion in pure metals with an indication of their reliability, will be useful to everyone in this field for the theory, fundamental research and industrial applications covered. • Up-to-date and complete (including EPMA and RBS investigations) • Indication of reliability of the measurements • Reassessment of many early results • Data can easily be extracted from Tables and Graphs
Impurity Diffusion in Metals
Author | : Gerhard Neumann,C. Tuijn |
Publsiher | : Trans Tech Publications Ltd |
Total Pages | : 206 |
Release | : 2002-11-07 |
Genre | : Technology & Engineering |
ISBN | : 9783035707144 |
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The systematic investigation of self-diffusion and impurity diffusion in metals began as a result of the availability of a wide variety of artificial radio- isotopes following the Second World War. During the following years, rapid advances in the theory of solid-state diffusion and the ever-increasing number of experimental data were comprehensively described in any number of textbooks and review papers. But impurity diffusion in metals was more or less superficially treated in the textbooks, and some of the review papers, with the result that - even up to now - a comprehensive review of the correct interpretation of impurity diffusion in metals has been lacking.
Magnesium Technology 2016
Author | : Alok Singh,Kiran Solanki,Michele Manuel,Neale Neelameggham |
Publsiher | : Springer |
Total Pages | : 402 |
Release | : 2016-12-12 |
Genre | : Technology & Engineering |
ISBN | : 9783319481142 |
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The Magnesium Technology Symposium, the event on which this collection is based, is one of the largest yearly gatherings of magnesium specialists in the world. Papers represent all aspects of the field, ranging from primary production to applications to recycling. Moreover, papers explore everything from basic research findings to industrialization. Magnesium Technology 2016 covers a broad spectrum of current topics, including alloys and their properties; cast products and processing; wrought products and processing; forming, joining, and machining; corrosion and surface finishing; ecology; and structural applications. In addition, there is coverage of new and emerging applications.
Bibliography on Self diffusion of Pure Metals in the Solid State 1950 1960
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 98 |
Release | : 1961 |
Genre | : Metals |
ISBN | : UOM:39015086497867 |
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Diffusion in Metals and Alloys
Author | : F. J. Kedves,D. L. Beke |
Publsiher | : Trans Tech Publications |
Total Pages | : 606 |
Release | : 1990 |
Genre | : Alloys |
ISBN | : UCSD:31822003849254 |
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Handbook of Solid State Diffusion Volume 2
Author | : Aloke Paul,Sergiy Divinski |
Publsiher | : Elsevier |
Total Pages | : 476 |
Release | : 2017-04-13 |
Genre | : Science |
ISBN | : 9780128045787 |
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Handbook of Solid State Diffusion, Volume 2: Diffusion Analysis in Material Applications covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the second of this two volume set. Volume 2 covers practical issues on diffusion phenomena in bulk, thin film, and in nanomaterials. Diffusion related problems and analysis of methods in industrial applications, such as electronic industry, high temperature materials, nuclear materials, and superconductor materials are discussed. Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion Covers bulk, thin film, and nanomaterials Introduces the problems and analysis in important materials systems in various applications Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Tracer Diffusion Data for Metals Alloys and Simple Oxides
Author | : John Askill |
Publsiher | : Springer Science & Business Media |
Total Pages | : 108 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9781468460759 |
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Atomic diffusion in metals was first discovered some sixty-five years ago, and since then a considerable wealth of data has ac cumulated on diffusion in various systems. However, work prior to about the year 1940 is now mainly of historical interest, since ex periments were often carried out under experimental conditions and with methods of analysis leading to uncertainties in inter preting the measured diffusion coefficients. Data on diffusion rates are of importance in processes which are controlled by rates of atomic migration such as growth of phases and homogenization of alloys. In addition diffusion plays an important part in theories of such phenomena as oxidation, plastic deformation, sintering, and creep. A tremendous advance in diffusion studies was made possible by the availability of radioactive isotopes of sufficiently high spe cific activity after the second world war. Measurements of self diffusion rates then became possible using radioactive isotopes having the same chemical properties as the solvent material, and it also became possible to study tracer impurity diffusion when the concentration of the impurity is so small as not to alter the chemi cal homogeneity of the system. In the last ten to fifteen years the purity of materials used in diffusion studies has increased con siderably and the methods of analysis have become more stand ardized.
Crystallography and Crystal Defects
Author | : Anthony Kelly,Kevin M. Knowles |
Publsiher | : John Wiley & Sons |
Total Pages | : 537 |
Release | : 2012-02-13 |
Genre | : Science |
ISBN | : 9780470750148 |
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Extensively revised and updated, this new edition of a classic text presents a unified approach to crystallography and to the defects found within crystals. The book combines the classical and exact description of symmetry of a perfect crystal with the possible geometries of the major defects-dislocations, stacking faults, point defects, twins, interfaces and the effects of martensitic transformations. A number of important concepts and exciting new topics have been introduced in this second edition, including piezoelectricity, liquid crystals, nanocrystalline concepts, incommensurate materials and the structure of foamed and amorphous solids. The coverage of quasicrystalline materials has been extended, and the data tables, appendices and references have been fully updated. Reinforcing its unrivalled position as the core text for teaching crystallography and crystal defects, each chapter includes problem sets with brief numerical solutions at the end of the book. Detailed worked solutions, supplementary lecture material and computer programs for crystallographic calculations are provided online (http://booksupport.wiley.com).