Silicon Processing For The Vlsi Era
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Silicon Processing for the VLSI Era Process technology
Author | : Stanley Wolf,Richard N. Tauber |
Publsiher | : Unknown |
Total Pages | : 890 |
Release | : 2000 |
Genre | : Technology & Engineering |
ISBN | : 0961672161 |
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Silicon Processing for the VLSI Era
![Silicon Processing for the VLSI Era](https://youbookinc.com/wp-content/uploads/2024/06/cover.jpg)
Author | : Stanley Wolf |
Publsiher | : Unknown |
Total Pages | : 0 |
Release | : 2000 |
Genre | : Integrated circuits |
ISBN | : OCLC:43698493 |
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Silicon Processing for the VLSI Era Process integration
![Silicon Processing for the VLSI Era Process integration](https://youbookinc.com/wp-content/uploads/2024/06/cover.jpg)
Author | : Stanley Wolf,Richard N. Tauber |
Publsiher | : Unknown |
Total Pages | : 753 |
Release | : 1986 |
Genre | : Technology & Engineering |
ISBN | : 0961672145 |
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Silicon Processing for the VLSI Era
![Silicon Processing for the VLSI Era](https://youbookinc.com/wp-content/uploads/2024/06/cover.jpg)
Author | : Stanley Wolf |
Publsiher | : Unknown |
Total Pages | : 135 |
Release | : 1986 |
Genre | : Electronic Book |
ISBN | : OCLC:924022355 |
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Silicon Nitride Silicon Dioxide and Emerging Dielectrics 9
Author | : Ram Ekwal Sah |
Publsiher | : The Electrochemical Society |
Total Pages | : 863 |
Release | : 2007 |
Genre | : Dielectric films |
ISBN | : 9781566775526 |
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This issue of ECS Transactions contains the papers presented in the symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectics held May 6-11, 2007 in Chicago. Papers were presented on deposition, characterization and applications of the dielectrics including high- and low-k dielectrics, as well as interface states, device characterization, reliabiliy and modeling.
Fundamentals of Electrochemical Deposition
Author | : Milan Paunovic,Mordechay Schlesinger |
Publsiher | : John Wiley & Sons |
Total Pages | : 388 |
Release | : 2006-08-11 |
Genre | : Science |
ISBN | : 9780470009390 |
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Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.
Modern Aspects of Electrochemistry 42
Author | : Constantinos G. Vayenas,Ralph E. White,Maria E. Gamboa-Aldeco |
Publsiher | : Springer Science & Business Media |
Total Pages | : 434 |
Release | : 2008-03-08 |
Genre | : Science |
ISBN | : 9780387494890 |
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This volume analyzes and summarizes recent developments in several key interfacial electrochemical systems in the areas of fuel cell electrocatatalysis, electrosynthesis and electrodeposition. The six Chapters are written by internationally recognized experts in these areas and address both fundamental and practical aspects of several existing or emerging key electrochemical technologies. The Chapter by R. Adzic, N. Marinkovic and M. Vukmirovic provides a lucid and authoritative treatment of the electrochemistry and electrocatalysis of Ruthenium, a key element for the devel- ment of efficient electrodes for polymer electrolyte (PEM) fuel cells. Starting from fundamental surface science studies and interfacial considerations, this up-to-date review by some of the pioneers in this field, provides a deep insight in the complex catalytic-electrocatalytic phenomena occurring at the interfaces of PEM fuel cell electrodes and a comprehensive treatment of recent developments in this extremely important field. Several recent breakthroughs in the design of solid oxide fuel cell (SOFC) anodes and cathodes are described in the Chapter of H. Uchida and M. Watanabe. The authors, who have pioneered several of these developments, provide a lucid presentation d- cribing how careful fundamental investigations of interfacial electrocatalytic anode and cathode phenomena lead to novel electrode compositions and microstructures and to significant practical advances of SOFC anode and cathode stability and enhanced electrocatalysis.
Introduction to Microfabrication
Author | : Sami Franssila |
Publsiher | : John Wiley & Sons |
Total Pages | : 428 |
Release | : 2004-06-14 |
Genre | : Technology & Engineering |
ISBN | : 0470851066 |
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Nanotechnology and microengineering are among the top priority research areas for the US and Europe. This text provides coverage of all aspects of the attempt to build functional devices at a molecular size.