Spectroscopic Ellipsometry And Reflectometry

While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.

Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments.

This Open Access book discusses an extension to low-coherence interferometry by dispersion-encoding. The approach is theoretically designed and implemented for applications such as surface profilometry, polymeric cross-linking estimation and the determination of thin-film layer thicknesses. During a characterization, it was shown that an axial measurement range of 79.91 μm with an axial resolution of 0.1 nm is achievable. Simultaneously, profiles of up to 1.5 mm in length were obtained in a scan-free manner. This marked a significant improvement in relation to the state-of-the-art in terms of dynamic range. Also, the axial and lateral measurement range were decoupled partially while functional parameters such as surface roughness were estimated. The characterization of the degree of polymeric cross-linking was performed as a function of the refractive index. It was acquired in a spatially-resolved manner with a resolution of 3.36 x 10-5. This was achieved by the development of a novel mathematical analysis approach.

Ellipsometry is the method of choice to determine the properties of surfaces and thin films. It provides comprehensive and sensitive characterization in contactless and non-invasive measurements. This book gives a state-of-the-art survey of ellipsometric investigations of organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. In conjunction with the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices and fabrication advances, the ellipsometric analysis of their optical and material properties has progressed rapidly in the recent years.

Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.