Vapour Growth And Epitaxy Proceedings Of The Third International Conference On Vapour Growth And Epitaxy Amsterdam The Net
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Vapour Growth and Epitaxy
Author | : G.W. Cullen,E. Kaldis,R.L. Parker |
Publsiher | : Elsevier |
Total Pages | : 409 |
Release | : 2013-09-03 |
Genre | : Science |
ISBN | : 9781483223575 |
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Vapor Growth and Epitaxy covers the proceedings of the Third International Conference on Vapor Growth and Epitaxy, held in Amsterdam, The Netherlands on August 18-21, 1975. This conference highlights the crystal growth aspects of the preparation, characterization, and perfection of thin films of electronic interest. This book is organized into two sections encompassing 54 chapters. The first section considers the fundamental and applied crystal growth studies of silicon, III-V and II-VI compounds, and magnetic garnets. This section also describes the structure of autoepitaxial diamond films and the morphology of single crystals grown from the vapor phase. The second section deals with nucleation and crystal growth kinetic studies of whiskers and the fabrication of solar cells. This section further surveys the equilibrium, kinetics, and epitaxy in the chemical vapor deposition of silicon compounds.
International Books in Print
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 668 |
Release | : 1979 |
Genre | : English imprints |
ISBN | : OSU:32435025271529 |
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Compound Semiconductor
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 554 |
Release | : 1998 |
Genre | : Compound semiconductors |
ISBN | : UOM:39015047362838 |
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The Engineering Index Annual
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 2398 |
Release | : 1994 |
Genre | : Engineering |
ISBN | : MINN:31951D01117024L |
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Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Physics Briefs
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 1224 |
Release | : 1994 |
Genre | : Physics |
ISBN | : UOM:39015027857286 |
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Electrical Electronics Abstracts
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 1860 |
Release | : 1997 |
Genre | : Electrical engineering |
ISBN | : OSU:32435059588608 |
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Metalorganic Vapor Phase Epitaxy MOVPE
Author | : Stuart Irvine,Peter Capper |
Publsiher | : John Wiley & Sons |
Total Pages | : 582 |
Release | : 2019-10-07 |
Genre | : Technology & Engineering |
ISBN | : 9781119313014 |
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Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).
Energy Research Abstracts
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 656 |
Release | : 1989 |
Genre | : Power resources |
ISBN | : MINN:30000010505687 |
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