Vlsi Science And Technology

Addressing the growing demand for larger capacity in information technology, VLSI Micro- and Nanophotonics: Science, Technology, and Applications explores issues of science and technology of micro/nano-scale photonics and integration for broad-scale and chip-scale Very Large Scale Integration photonics. This book is a game-changer in the sense that it is quite possibly the first to focus on "VLSI Photonics". Very little effort has been made to develop integration technologies for micro/nanoscale photonic devices and applications, so this reference is an important and necessary early-stage perspective on this field. New demand for VLSI photonics brings into play various technological and scientific issues, as well as evolutionary and revolutionary challenges—all of which are discussed in this book. These include topics such as miniaturization, interconnection, and integration of photonic devices at micron, submicron, and nanometer scales. With its "disruptive creativity" and unparalleled coverage of the photonics revolution in information technology, this book should greatly impact the future of micro/nano-photonics and IT as a whole. It offers a comprehensive overview of the science and engineering of micro/nanophotonics and photonic integration. Many books on micro/nanophotonics focus on understanding the properties of individual devices and their related characteristics. However, this book offers a full perspective from the point of view of integration, covering all aspects of benefits and advantages of VLSI-scale photonic integration—the key technical concept in developing a platform to make individual devices and components useful and practical for various applications.

The trend in design and manufacturing of very large-scale integrated (VLSI) circuits is towards smaller devices on increasing wafer dimensions. VLSI is the inter-disciplinary science of the process of creating an integrated circuit (IC) by combining thousands of transistors into a single chip. VLSI design can reduce the area of the circuit, making it less expensive and requiring less power.The book gives an understanding of the underlying principles of the subject. It not only focuses on circuit design process obeying VLSI rules but also on technological aspects of prototyping and fabrication. All the clocking processes, interconnects, and circuits of CMOS are explained in this book in an understandable format. The book provides contents on VLSI Physical Design Automation, Design of VLSI Devices and also its Impact on Physical Design.The book is intended as a reference book for senior undergraduate, first-year post graduate students, researchers as well as academicians in VLSI design, electronics & electrical engineering, and materials science. The basics and applications of VLSI design from STA, PDA and VLSI Testing along with FPGA based Prototyping are covered in a comprehensive manner.The latest technology used in VLSI design is discussed along with the available tools for FPGA prototyping as well as ASIC design. Each unit contains technical questions with solutions at the end.Technical topics discussed in the book include: • Static Timing Analysis• CMOS Layout and Design rules• Physical Design Automation• Testing of VLSI Circuits• Software tools for Frontend and Backend design.

Research collected from many disciplines, including computer architecture, computer-aided design, parallel algorithms, semiconductor technology, and testing.

The current cutting-edge VLSI circuit design technologies provide end-users with many applications, increased processing power and improved cost effectiveness. This trend is accelerating, with significant implications on future VLSI and systems design. VLSI design engineers are always in demand for front-end and back-end design applications.The book aims to give future and current VSLI design engineers a robust understanding of the underlying principles of the subject. It not only focuses on circuit design processes obeying VLSI rules but also on technological aspects of fabrication. The Hardware Description Language (HDL) Verilog is explained along with its modelling style. The book also covers CMOS design from the digital systems level to the circuit level. The book clearly explains fundamental principles and is a guide to good design practices.The book is intended as a reference book for senior undergraduate, first-year post graduate students, researchers as well as academicians in VLSI design, electronics & electrical engineering and materials science. The basics and applications of VLSI design from digital system design to IC fabrication and FPGA Prototyping are each covered in a comprehensive manner. At the end of each unit is a section with technical questions including solutions which will serve as an excellent teaching aid to all readers.Technical topics discussed in the book include: • Digital System Design• Design flow for IC fabrication and FPGA based prototyping • Verilog HDL• IC Fabrication Technology• CMOS VLSI Design• Miscellaneous (It covers basics of Electronics, and Reconfigurable computing, PLDs, Latest technology etc.).

Low-power and low-energy VLSI has become an important issue in today's consumer electronics.This book is a collection of pioneering applied research papers in low power VLSI design and technology.A comprehensive introductory chapter presents the current status of the industry and academic research in the area of low power VLSI design and technology.Other topics cover logic synthesis, floorplanning, circuit design and analysis, from the perspective of low power requirements.The readers will have a sampling of some key problems in this area as the low power solutions span the entire spectrum of the design process. The book also provides excellent references on up-to-date research and development issues with practical solution techniques.

Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, also describes the properties of other SOI devices, such as multiple gate MOSFETs, dynamic threshold devices and power MOSFETs. The advantages and performance of SOI circuits used in both niche and mainstream applications are discussed in detail. The SOI specialist will find this book invaluable as a source of compiled references covering the different aspects of SOI technology. For the non-specialist, the book serves an excellent introduction to the topic with detailed, yet simple and clear explanations. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition is recommended for use as a textbook for classes on semiconductor device processing and physics at the graduate level.

Copper (Cu) has been used as an interconnection material in the semiconductor industry for years owing to its best balance of conductivity and performance. However, it is running out of steam as it is approaching its limits with respect to electrical performance and reliability. Graphene is a non-metal material, but it can help to improve electromigration (EM) performance of Cu because of its excellent properties. Combining graphene with Cu for very large-scale integration (VLSI) interconnects can be a viable solution. The incorporation of graphene into Cu allows the present Cu fabrication back-end process to remain unaltered, except for the small step of “inserting” graphene into Cu. Therefore, it has a great potential to revolutionize the VLSI integrated circuit (VLSI-IC) industry and appeal for further advancement of the semiconductor industry. This book is a compilation of comprehensive studies done on the properties of graphene and its synthesis methods suitable for applications of VLSI interconnects. It introduces the development of a new method to synthesize graphene, wherein it not only discusses the method to grow graphene over Cu but also allows the reader to know how to optimize graphene growth, using statistical design of experiments (DoE), on Cu interconnects in order to obtain good-quality and reliable interconnects. It provides a basic understanding of graphene–Cu interaction mechanism and evaluates the electrical and EM performance of graphenated Cu interconnects.