Atomic Layer Deposition Of Nanostructured Materials

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.

本书内容强调纳米材料的合成,详细介绍了常用的化学和物理纳米合成方法的原理和基本程序,并介绍了各种方法的最新进展和参考文献

A fundamental part of modern technology is composed of devices that use special materials as main components. Since the last few decades of the last century and even more recently, a remarkable development has been achieved in new micro- and nanostructured materials with compositional structures and production methods that open unprecedented technological, economic, and ecological perspectives due to high yields, economies of scale, the possibility of reducing weight and size, and the low environmental impact of the equipment that contains them. This book offers a collection of excellent studies that use state-of-the-art methodologies developed by professional researchers from different countries in diverse areas of materials. In this way, this book is particularly useful to academics, scientists, practicing researchers, and postgraduate students whose work relates to the latest nanomaterial technologies.

Nanomaterials and nanostructures are the original product of nanotechnology, and the key building blocks for enabling technologies. In this context, this book presents a concise overview of the synthesis and characterization methods of nanomaterials and nanostructures, while integrating facets of physics, chemistry, and engineering. The book summarizes the fundamentals and technical approaches in synthesis, and processing of nanostructures and nanomaterials, so as the reader can have a systematic and quick picture of the field. This book focuses on functional aspects of nanomaterials that have a high relevance to immediate applications, such as catalysis, energy harvesting, biosensing, and surface functionalization. There are chapters addressing nanostructured materials and composites and covering basic properties and requirements of this new class of engineered materials.

This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.

This comprehensive book set includes four volumes, covering the methods and protocols for the synthesis, fabrication, and characterization of nanomaterials. The first two books introduce the solution phase and gas synthesis approaches for nanomaterials, providing a number of most widely used protocols for each nanomaterial. An exhaustive list of nanomaterials are included, which are arranged according to the atomic number of the main element in the compound for easy search. For each material, the protocols are categorized according to the morphology of the nanostructure. A detailed reference is included in each protocol to point the readers to the source of the protocol. The third book describes many unconventional methods for the fabrication of nanostructures, including lithography and printing, self-assembly, chemical transformation, templated synthesis, electrospinning, laser induced synthesis, flame and plasma synthesis, and atomic layer deposition processes. The fourth book covers the typical methods for structural characterization of nanomaterials, including electron diffraction, electron microscopy, atomic force microscopy, scanning tunneling microscopy, X-ray diffraction, in-situ and operando X-ray techniques, X-ray absorption fine structure spectroscopy, static and dynamic light scattering, vibrational characterization methods, and NMR spectroscopy. In addition to the introduction of the basic operational principles of these tools, the book focuses explicitly on how they can be applied for analyzing nanomaterials. The handbook is a complete reference that can provide readers easily accessible information on how to synthesize and characterize nanomaterials desired for their target applications.

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.