Chemical Solution Deposition Of Semiconductor Films

Discussing specific depositions of a wide range of semiconductors and properties of the resulting films, Chemical Solution Deposition of Semiconductor Films examines the processes involved and explains the effect of various process parameters on final film and film deposition outcomes through the use of detailed examples. Supplying experimental res

Chemical Solution Synthesis for Materials Design and Thin Film Device Applications presents current research on wet chemical techniques for thin-film based devices. Sections cover the quality of thin films, types of common films used in devices, various thermodynamic properties, thin film patterning, device configuration and applications. As a whole, these topics create a roadmap for developing new materials and incorporating the results in device fabrication. This book is suitable for graduate, undergraduate, doctoral students, and researchers looking for quick guidance on material synthesis and device fabrication through wet chemical routes. Provides the different wet chemical routes for materials synthesis, along with the most relevant thin film structured materials for device applications Discusses patterning and solution processing of inorganic thin films, along with solvent-based processing techniques Includes an overview of key processes and methods in thin film synthesis, processing and device fabrication, such as nucleation, lithography and solution processing

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously.

The author provides a unified account of the electrochemical material science of metal chalcogenide (MCh) compounds and alloys with regard to their synthesis, processing and applications. Starting with the chemical fundamentals of the chalcogens and their major compounds, the initial part of the book includes a systematic description of the MCh solids on the basis of the Periodic Table in terms of their structures and key properties. This is followed by a general discussion on the electrochemistry of chalcogen species, and the principles underlying the electrochemical formation of inorganic compounds/alloys. The core of the book offers an insight into available experimental results and inferences regarding the electrochemical preparation and microstructural control of conventional and novel MCh structures. It also aims to survey their photoelectrochemistry, both from a material-oriented point of view and as connected to specific processes such as photocatalysis and solar energy conversion. Finally, the book illustrates the relevance of MCh materials to various applications of electrochemical interest such as (electro)catalysis in fuel cells, energy storage with intercalation electrodes, and ion sensing.

This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.

Solution Methods for Metal Oxide Nanostructures reviews solution processes that are used for synthesizing 1D, 2D and 3D metal oxide nanostructures in either thin film or in powder form for various applications. Wet-chemical synthesis methods deal with chemical reactions in the solution phase using precursors at proper experimental conditions. Wet-chemical synthesis routes offer a high degree of controllability and reproducibility for 2D nanomaterial fabrication. Solvothermal synthesis, template synthesis, self-assembly, oriented attachment, hot-injection, and interface-mediated synthesis are the main wet-chemical synthesis routes for 2D nanomaterials. Solution Methods for Metal Oxide Nanostructures also addresses the thin film deposition metal oxides nanostructures, which plays a very important role in many areas of chemistry, physics and materials science.Each chapter includes information on a key solution method and their application in the design of metal oxide nanostructured materials with optimized properties for important applications. The pros and cons of the solution method and their significance and future scope is also discussed in each chapter. Readers are provided with the fundamental understanding of the key concepts of solution synthesis methods for fabricating materials and the information needed to help them select the appropriate method for the desired application. Reviews the most relevant wet chemical solution methods for metal oxide nanostructures, including sol-gel, solvothermal, hydrothermal, co-precipitation methods, and more Addresses thin film deposition techniques for metal oxide nanostructures, such as spray-pyrolysis, electrodeposition, spin coating and self-assembly Discusses the pros and cons of each solution method and its significance and future opportunities