Directed Self Assembly Of Block Copolymer Films On Chemically Nanopatterned Surfaces

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and academic institutions around the world define subfields, offer practical instructions and examples, and pave the way for future research. Helping readers to select the proper fabricating technique for their experiments, the book provides a broad vision of the most critical problems and explains how to solve them. It includes basic definitions and introduces the main underlying concepts of nanofabrication. The book also discusses the major advantages and disadvantages of each approach and offers a wide variety of examples of cutting-edge applications. Each chapter focuses on a particular method or aspect of study. For every method, the contributors describe the underlying theoretical basis, resolution, patterns and substrates used, and applications. They show how applications at the nanoscale require a different process and understanding than those at the microscale. For each experiment, they elucidate key solutions to problems relating to materials, methods, and surface considerations. A complete resource for this rapidly emerging interdisciplinary field, this handbook provides practical information for planning the experiments of any project that employs nanofabrication techniques. It gives readers a foundation to enter the complex world of nanofabrication and inspires the scientific community at large to push the limits of nanometer resolution.

Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.