Impurities In Engineering Materials

Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.

Provides a state-of-the-art account of the various effects of impurities on the properties of engineering alloys. Outlines a wide range of methods for producing cleaner alloys. Traces the technological advances that allow the economical manufacture of purer materials.

A Textbook for the students of B.Sc.(Engg.), B.E., B.Tech., AMIE and Diploma Courses. A new chapter on ""Semiconductor Fabrication Technology and Miscellaneous Semiconductor Devices"" had been included and additional self-assessment questions with answers and additional worked examples had been provided at the end of the BOOK.

This book emphasizes the importance of the fascinating atomistic insights into the defects and the impurities as well as the dynamic behaviors in silicon materials, which have become more directly accessible over the past 20 years. Such progress has been made possible by newly developed experimental methods, first principle theories, and computer simulation techniques. The book is aimed at young researchers, scientists, and technicians in related industries. The main purposes are to provide readers with 1) the basic physics behind defects in silicon materials, 2) the atomistic modeling as well as the characterization techniques related to defects and impurities in silicon materials, and 3) an overview of the wide range of the research fields involved.

A discussion of the different mechanisms responsible for contamination together with a survey of their impact on device performance. The author examines the specific properties of main and rare impurities in silicon, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. Throughout all of these subjects, the book presents only reliable and up-to-date data so as to provide a thorough review of recent scientific investigations.

This book gives a unique review of different aspects of metallic contaminations in Si and Ge-based semiconductors. All important metals are discussed including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on the electrical device performance. Several control and possible gettering approaches are addressed. The book is a reference for researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. It has an interdisciplinary nature by combining different disciplines such as material science, defect engineering, device processing, defect and device characterization and device physics and engineering.