Introduction To Surface And Thin Film Processes

This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application

This book is a conceptual overview of surface and thin film science, providing a basic and straightforward understanding of the most common ideas and methods used in these fields. Fundamental scientific ideas, deposition methods, and characterization methods are all examined. Relying on simple, conceptual models and figures, fundamental scientific ideas are introduced and then applied to surfaces and thin films in the first half of the book. Topics include vacuum and plasma environments, crystal structure, atomic motion, thermodynamics, electrical and magnetic properties, optical and thermal properties, and adsorbed atoms on surfaces. Common methods of gas-phase thin film deposition are then introduced, starting with an overview of the film growth process and then a discussion of both physical and chemical vapor deposition methods. This is followed by an overview of a wide range of characterization techniques including imaging, structural, chemical, electrical, magnetic, optical, thermal, and mechanical techniques. Thin film science is a natural extension of surface science, especially as applications involve thinner and thinner films; distinct from other literature in the field, this book combines the two topics in a single volume. Simple, conceptual models and figures are used, supported by some mathematical expressions, to convey key ideas to students as well as practicing engineers, scientists, and technicians.

Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

"This book is a conceptual overview of surface and thin film science, providing a basic and straightforward understanding of the most common ideas and methods used in these fields. Fundamental scientific ideas, deposition methods and characterization methods are all examined. Relying on simple, conceptual models and figures, fundamental scientific ideas are introduced and then applied to surfaces and thin films in the first half of the book. Topics include vacuum and plasma environments, crystal structure, atomic motion, thermodynamics, electrical and magnetic properties, optical and thermal properties, and adsorbed atoms on surfaces. Common methods of gas phase thin film deposition are then introduced, starting with an overview of the film growth process and then a discussion of both physical and chemical vapor deposition methods. This is followed by an overview of a wide range of characterization techniques including imaging, structural, chemical, electrical, magnetic, optical, thermal, and mechanical techniques. Thin film science is a natural extension of surface science, especially as applications involve thinner and thinner films; distinct from other literature in the field, this book combines the two topics in a single volume. Simple, conceptual models and figures are used, supported by some mathematical expressions, to convey key ideas to students as well as practicing engineers, scientists, and technicians"--

Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)

This book provides a clear and understandable text for users and developers of advanced engineered materials, particularly in the area of thin films, and addresses fundamentals of modifying the optical, electrical, photo-electric, triboligical, and corrosion resistance of solid surfaces and adding functionality to solids by engineering their surface, structure, and electronic, magnetic and optical structure. Thin film applications are emphasized. Through the inclusion of multiple clear examples of the technologies, how to use them,and the synthesis processes involved, the reader will gain a deep understanding of the purpose, goals, and methodology of surface engineering and engineered materials. Virtually every advance in thin film, energy, medical, tribological materials technologies has resulted from surface engineering and engineered materials. Surface engineering involves structures and compositions not found naturally in solids and is used to modify the surface properties of solids and involves application of thin film coatings, surface functionalization and activation, and plasma treatment. Engineered materials are the future of thin film technology. Engineered structures such as superlattices, nanolaminates, nanotubes, nanocomposites, smart materials, photonic bandgap materials, metamaterials, molecularly doped polymers and structured materials all have the capacity to expand and increase the functionality of thin films and coatings used in a variety of applications and provide new applications. New advanced deposition processes and hybrid processes are being used and developed to deposit advanced thin film materials and structures not possible with conventional techniques a decade ago. Properties can now be engineered into thin films that achieve performance not possible a decade ago.

Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.