Iterate Or Die

The principal aim of this text is to encourage the development and application of numerical modelling techniques as an aid to achieving greater efficiency and optimization of metal-forming processes. The contents of this book have therefore been carefully planned to provide both an introduction to the fundamental theory of material deformation simulation, and also a comprehensive survey of the "state-of-the-art" of deformation modelling techniques and their application to specific and industrially relevant processes. To this end, leading international figures in the field of material deformation research have been invited to contribute chapters on subjects on which they are acknowledged experts. The information in this book has been arranged in four parts: Part I deals with plasticity theory, Part II with various numerical modelling techniques, Part III with specific process applications and material phenomena and Part IV with integrated computer systems. The objective of Part I is to establish the underlying theory of material deformation on which the following chapters can build. It begins with a chapter which reviews the basic theories of classical plasticity and describes their analytical representations. The second chapter moves on to look at the theory of deforming materials and shows how these expressions may be used in numerical techniques. The last two chapters of Part I provide a review of isotropic plasticity and anisotropic plasticity.

Reprint of the original, first published in 1871. The publishing house Anatiposi publishes historical books as reprints. Due to their age, these books may have missing pages or inferior quality. Our aim is to preserve these books and make them available to the public so that they do not get lost.

Reprint of the original, first published in 1869.

This dissertation addresses the two biggest challenges in Design for Manufacturing (DFM), how to inject process variations into design and how to identify and quantitatively characterize the main sources of transistor performance variation so that the information that is fed into design is accurate enough to make design tradeoff decisions effectively. To address these challenges the Collaborative Platform for DFM has been built in three main parts; the Parametric Yield Simulator, which is a scripted link between process simulation, non-rectangular device modeling, and circuit simulation, a process characterization strategy that leverages a large set of process sensitive electrical test structures for extracting process conditions, and a collaborative database that serves as the glue between simulation and experiment and facilitates high volume data analysis. The Parametric Yield Simulator (PYS) is built as a modular platform that links processing, currently lithography simulation, device modeling, and circuit analysis. This simulation flow is built around a non-rectangular transistor model that uses a set of channel position dependent slice lookup tables for fast model generation and translates a 2D geometrical gate shape into an equivalent 1D compact transistor model. The PYS can be wrapped with perl scripts to simulate layouts across the lithographic process window and hence be used for rapid prototyping of process sensitive test structures.