Materials Research Society Symposium Proceedings Volume 746 Magnetoelectronics And Magnetic Materials Novel Phenomena And Advanced Characterization

The papers in this volume are drawn from Symposium Q, "Magnetoelectronics-Novel Magnetic Phenomena in Nanostructures," and Symposium R, "Advanced Characterization of Artificially Structured Magnetic Materials," which were held December 1-5 at the 2002 MRS Fall Meeting in Boston, Massachusetts. The common focus of interest was on artificially engineered nanostructured magnetic systems. The two symposia discussed new phenomena in such systems that are interesting for magnetoelectronic applications, their preparation, and advanced methodology for characterization. Interest in nanomagnetism has been catalyzed by advances in two fields of research: (i) Advances in materials synthesis of structures whose length scales transcend magnetic length scales and open the possibility for creating materials with new magnetic properties. Such structures include interfaces, superlattices, tunneling devices, nanostructures, and single-molecule magnets. (ii) Advances in sample characterization techniques for nanomagnetism allow detailed exploration of structure-property relationships in nanostructured magnetic systems. The symposia reviewed current trends in both fields, and provided a forum for discussions about the outlook for further advances and new capabilities.

This book combines the proceedings of Symposium Q, Magnetoelectronics-Novel Magnetic Phenomena in Nanostructures, and Symposium R, Advanced Characterization of Artificially Structured Magnetic Materials, both from the 2002 MRS Fall Meeting in Boston. The common focus is on artificially engineered nanostructured magnetic systems. The two symposia address new phenomena in magnetoelectronic applications, their preparation, and advanced methodology for characterization. Interest in nanomagnetism has been catalyzed by advances in two fields of research. 1) Advances in materials synthesis of structures whose length scales transcend magnetic length scales and open the possibility for creating materials with new magnetic properties. Such structures include interfaces, superlattices, tunneling devices, nanostructures, and single-molecule magnets. 2) Advances in sample characterization techniques for nano-magnetism which allow detailed exploration of structure-property relationships in nanostructured magnetic systems. The volume highlights current trends in both fields and offers an outlook for further advances and new capabilities.

A primary driver of progress in nanoscience and technology is the continuing advances in the ability to measure structure, and particularly properties, at spatially localized scales. From the point of view of characterization, it is worth mentioning advances in the interpretation of processes in semiconductors, the ability to observe and manipulate metal, carbon and silicon nanowires and nanodots, and studies in molecular self-assembly. The papers in this book fall into two categories - those addressing classes of characterization techniques that emphasize how the combination of theoretical, experimental, and instrumentational developments lead to new capabilities in nanoscale characterization, and those focused on the use of various spatially localized approaches on a single phenomenon or materials issue. Topics include: characterization with electron optics; novel measurements of nanoscale properties; size-dependent behavior of nanoparticles; biological systems at the nanoscale; processing and properties of nanowires and heterostructures; and local phenomena in materials and microstructures.

Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.

In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.

Since the inauguration of the MRS symposium series on advanced optical processing of materials back in 1990, the number of optical-based techniques applied to process materials and the capabilities of optical systems has continued to expand and improve beyond simple pulsed-laser deposition of thin films. In turn, the scope of materials being investigated has also increased from oxide ceramics to include alloys, polymers and bio-materials. Many of the most exciting areas presented in this interdisciplinary forum include current and future applications in engineering materials at the mesoscopic-to-nanometer scale, optoelectronics, biomaterials, sensors and electronics. Advanced optical processing of materials now includes laser interactions with materials that are specially designed to optimize the beneficial qualities of laser modification. However, femtosecond processing of materials emerged as the dominant theme this year and several papers on this topic are featured. Another hot topic is one connected with biomedical applications--the controlled delivery of drugs to increase their efficacy by coating a fluidized bed of drug powders with biodegradable polymers was realized by conventional pulsed-laser deposition (PLD) and matrix assisted pulsed-laser evaporation (MAPLE) or by microencapsulation.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This 2003 volume focuses on experimentally validated multiscale modeling of ductile metals and alloys.