Nucleation and Growth in Applied Materials

Nucleation and Growth in Applied Materials
Author: Manuel Eduardo Palomar-Pardavé,Tu Le Manh
Publsiher: Elsevier
Total Pages: 258
Release: 2024-01-18
Genre: Technology & Engineering
ISBN: 9780323995382

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Nucleation and Growth in Applied Materials covers fundamental aspects of thermodynamics and kinetics, nucleation and growth phenomena occurring during materials processing and synthesis in engineering of materials. Theoretical and practical approaches used to identify and quantify nucleation are analyzed. These approaches can be used to explain the relationship of the physical properties of the material with nucleation and growth processes. Sections cover modern methods such as SEM, TEM, EBSD microtexture, X-ray macrotexture and modeling and simulation (Monte Carlo, Molecular dynamic simulation, machine learning, etc.). Based on these observations, their applications in engineering materials and processes are discussed. Moreover, methodology (experimental and modeling) of nucleation and growth of metals and other materials from aqueous and nonaqueous solvents using electrochemical means are reviewed. Although nucleation and growth are well-studied processes in materials, the quantification of the number of nuclei during these processes are complicated. A key aim of the book is to systematize information and share knowledge about the nucleation and growth phenomena occurring in different engineering processes related to materials science and engineering. Provides the key principles and definitions to understanding nucleation and growth processes in materials and the relationship between these processes and bulk material properties Describes criteria for nucleation in different materials and methods for quantification, materials characterization and modeling Discusses materials design strategies to apply understanding of materials chemical composition and structure to the improvement of material properties and creation of new materials

Applied Materials Research

Applied Materials Research
Author: Anonim
Publsiher: Unknown
Total Pages: 554
Release: 1965
Genre: Materials
ISBN: UOM:39015023314621

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Latest Development of Applied Materials Technology

Latest Development of Applied Materials Technology
Author: Shan Tung Tu,G.Z. Wang,Jian Ming Gong
Publsiher: Trans Tech Publications Ltd
Total Pages: 228
Release: 2012-04-25
Genre: Technology & Engineering
ISBN: 9783038138266

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Volume is indexed by Thomson Reuters CPCI-S (WoS). The present volumes contain selected papers providing worldwide state-of-the art knowledge in the fields of thin film and nano materials, composites, coatings, high-temperature alloys, rare-earth materials, energy materials, biological materials, materials strength, design and simulation, and materials processing. This wealth of up-to-date comprehensive information will be of value to anyone working in these domains.

Nucleation in Condensed Matter

Nucleation in Condensed Matter
Author: Ken Kelton,Alan Lindsay Greer
Publsiher: Elsevier
Total Pages: 759
Release: 2010-03-19
Genre: Technology & Engineering
ISBN: 9780080912646

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In Nucleation in Condensed Matter, key theoretical models for nucleation are developed and experimental data are used to discuss their range of validity. A central aim of this book is to enable the reader, when faced with a phenomenon in which nucleation appears to play a role, to determine whether nucleation is indeed important and to develop a quantitative and predictive description of the nucleation behavior. The third section of the book examines nucleation processes in practical situations, ranging from solid state precipitation to nucleation in biological systems to nucleation in food and drink. Nucleation in Condensed Matter is a key reference for an advanced materials course in phase transformations. It is also an essential reference for researchers in the field. Unified treatment of key theories, experimental evaluations and case studies Complete derivation of key models Detailed discussion of experimental measurements Examples of nucleation in diverse systems

Updates on Titanium Dioxide

Updates on Titanium Dioxide
Author: Bochra Bejaoui
Publsiher: BoD – Books on Demand
Total Pages: 260
Release: 2023-08-30
Genre: Technology & Engineering
ISBN: 9781803556727

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Titanium dioxide (TiO2) has received a lot of attention due to its inexpensive cost, benign nature, and great photocatalytic potential. TiO2 has numerous applications, including in photocatalysts, Li-ion batteries, solar cells, and medical research. However, its performance is unsatisfactory due to a variety of issues, including a wide band gap (3.01 to 3.2 eV) and quick electron–hole pair recombination (1012 to 1011 s). Many efforts have been made to improve the qualities of TiO2, such as structural and dopant changes, which expand its applications. This book focuses on the properties of TiO2-modified nanoparticles, including their synthesis, alterations, and applications.

Applied Materials and Technologies

Applied Materials and Technologies
Author: Xiao Peng Xiong,Ran Zhang
Publsiher: Trans Tech Publications Ltd
Total Pages: 230
Release: 2015-11-05
Genre: Technology & Engineering
ISBN: 9783035700718

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Collection of selected, peer reviewed papers from the 9th International Forum on Advanced Material Science and Technology (IFAMST9), November 30 - December 3, 2014, Xiamen, China. The 45 papers are grouped as follows: Chapter 1: Steels and Alloys; Chapter 2: Applied Chemical Materials and Technologies; Chapter 3: Functional Materials; Chapter 4: Technologies in Area of Silicon Production and Fuel Cells; Chapter 5: Mechanical Properties of Materials; Chapter 6: Surfaces, Coatings and Heat Treatment; Chapter 7: Recycling of Waste; Chapter 8: Technical Provision of Researches and Technological Processes

Novel Aspects of Diamond II

Novel Aspects of Diamond II
Author: Soumen Mandal
Publsiher: Springer Nature
Total Pages: 530
Release: 2024
Genre: Diamonds, Industrial
ISBN: 9783031475566

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This edited book covers a wide range of novel scientific and engineering aspects of diamond films produced from chemical vapor deposition. It focuses on the most recent developments and achievements in this rapidly growing field from scientists and engineers across the domains of chemistry, biology, medicine, physics, and semiconductor engineering. The latest volume of this consistently well-cited book brings an updated, systematic review of the latest developments in diamond research and application. Featuring contributed chapters from a mix of highly-active international researchers, this new edition presents recent research focusing on topics such as diamond for thermal management in high-power electronics, diamond MOSFETs, water treatment, application of machine learning for nanodiamonds, theoretical aspects of diamond growth, current trends in emerging diamond technologies, and the growth of doped single-crystal diamond. This book is especially appealing to interdisciplinary researchers and industry professionals working on advanced diamond devices and applications, as well as theoretical and computational methods for predicting and designing new diamond materials.

Chemical Vapor Deposition

Chemical Vapor Deposition
Author: Srinivasan Sivaram
Publsiher: Springer Science & Business Media
Total Pages: 302
Release: 2013-11-11
Genre: Technology & Engineering
ISBN: 9781475747515

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In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.