Proceedings Of The Symposium On Electromigration Of Metals And First International Symposium On Multilevel Metallization And Packaging
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Proceedings of the Symposium on Electromigration of Metals and First International Symposium on Multilevel Metallization and Packaging
Author | : James R. Lloyd |
Publsiher | : Unknown |
Total Pages | : 214 |
Release | : 1985 |
Genre | : Electrodiffusion |
ISBN | : PSU:000011177180 |
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The Chemistry of Metal CVD
Author | : Toivo T. Kodas,Mark J. Hampden-Smith |
Publsiher | : John Wiley & Sons |
Total Pages | : 562 |
Release | : 2008-09-26 |
Genre | : Technology & Engineering |
ISBN | : 9783527615841 |
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High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Interconnect and Contact Metallization for ULSI
Author | : G. S. Mathad,Hamir Singh Rathore,Y. Arita |
Publsiher | : The Electrochemical Society |
Total Pages | : 358 |
Release | : 2000 |
Genre | : Science |
ISBN | : 1566772540 |
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IBM Journal of Research and Development
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 550 |
Release | : 1992 |
Genre | : Electrical engineering |
ISBN | : UOM:39015023885851 |
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Proceedings of the Symposium on Reliability of Metals in Electronics
Author | : Hazara S. Rathore |
Publsiher | : The Electrochemical Society |
Total Pages | : 258 |
Release | : 1995 |
Genre | : Technology & Engineering |
ISBN | : 1566770971 |
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Proceedings of the Symposium on Interconnect and Contact Metallization
Author | : Harzara S. Rathore |
Publsiher | : The Electrochemical Society |
Total Pages | : 292 |
Release | : 1998 |
Genre | : Computers |
ISBN | : 1566771846 |
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Proceedings International IEEE VLSI Multilevel Interconnection Conference
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 518 |
Release | : 1988 |
Genre | : Hybrid integrated circuits |
ISBN | : UVA:X001472453 |
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3rd International Symposium on High Temperature Metallurgical Processing
Author | : Tao Jiang,Jiann-Yang Hwang,Patrick Masset,Onuralp Yucel,Rafael Padilla,Guifeng Zhou |
Publsiher | : John Wiley & Sons |
Total Pages | : 548 |
Release | : 2012-05-09 |
Genre | : Technology & Engineering |
ISBN | : 9781118365007 |
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Proceedings of a symposium sponsored by the Pyrometallurgy Committee and the Energy Committee of the Extraction and Processing Division of TMS (The Minerals, Metals & Materials Society) Held during the TMS 2012 Annual Meeting & Exhibition Orlando, Florida, USA March 11-15, 2012