Sige And Ge
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SiGe and Ge
Author | : David Louis Harame |
Publsiher | : The Electrochemical Society |
Total Pages | : 1280 |
Release | : 2006 |
Genre | : Electronic apparatus and appliances |
ISBN | : 9781566775076 |
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The second International SiGe & Ge: Materials, Processing, and Devices Symposium was part of the 2006 ECS conference held in Cancun, Mexico from October 29-Nov 3, 2006. This meeting provided a forum for reviewing and discussing all materials and device related aspects of SiGe & Ge. The hardcover edition includes a bonus CD-ROM containing the PDF of the entire issue.
SiGe Ge and Related Compounds 4 Materials Processing and Devices
Author | : D. Harame |
Publsiher | : The Electrochemical Society |
Total Pages | : 1066 |
Release | : 2010-10 |
Genre | : Science |
ISBN | : 9781566778251 |
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Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds has become a key component in the arsenal in improving semiconductor performance. This symposium discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
SiGe Ge and Related Compounds 3 Materials Processing and Devices
Author | : David Harame |
Publsiher | : The Electrochemical Society |
Total Pages | : 1136 |
Release | : 2008 |
Genre | : Electronic apparatus and appliances |
ISBN | : 9781566776561 |
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Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
SiGe Ge and Related Compounds 6
Author | : David Louis Harame |
Publsiher | : Unknown |
Total Pages | : 1014 |
Release | : 2014 |
Genre | : Electronic apparatus and appliances |
ISBN | : 1623321867 |
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SiGe Ge and Related Compounds Materials Processing and Devices 8
Author | : Q. Liu,J.-M. Hartmann,A. Thean,S. Miyazaki,A. Ogura,X. Gong,M. Caymax,A. Schulze,G. Masini,A. Mai,M. Östling,G. Niu,D. Harame |
Publsiher | : The Electrochemical Society |
Total Pages | : 450 |
Release | : 2018-09-21 |
Genre | : Science |
ISBN | : 9781607688532 |
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SiGe Ge and Related Compounds 6 Materials Processing and Devices
Author | : D. Harame,M. Caymax,M. Heyns,G. Masini,S. Miyazaki,G. Niu,A. Reznicek,K. Saraswat,B. Tillack,B. Vincent,Y. C. Yeo,A. Ogura,J. Murota |
Publsiher | : The Electrochemical Society |
Total Pages | : 1042 |
Release | : 2024 |
Genre | : Electronic Book |
ISBN | : 9781607685432 |
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SiGe Ge and Related Compounds 6 Materials Processing and Devices
Author | : Anonim |
Publsiher | : Unknown |
Total Pages | : 135 |
Release | : 2014 |
Genre | : Electronic Book |
ISBN | : OCLC:947792827 |
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Science and Technology of Semiconductor On Insulator Structures and Devices Operating in a Harsh Environment
Author | : Denis Flandre,Alexei N. Nazarov,Peter L.F. Hemment |
Publsiher | : Springer Science & Business Media |
Total Pages | : 358 |
Release | : 2006-05-06 |
Genre | : Technology & Engineering |
ISBN | : 9781402030130 |
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This proceedings volume archives the contributions of the speakers who attended the NATO Advanced Research Workshop on “Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment” held at the Sanatorium Puscha Ozerna, th th Kyiv, Ukraine, from 25 to 29 April 2004. The semiconductor industry has maintained a very rapid growth during the last three decades through impressive technological achievements which have resulted in products with higher performance and lower cost per function. After many years of development semiconductor-on-insulator materials have entered volume production and will increasingly be used by the manufacturing industry. The wider use of semiconductor (especially silicon) on insulator materials will not only enable the benefits of these materials to be further demonstrated but, also, will drive down the cost of substrates which, in turn, will stimulate the development of other novel devices and applications. In itself this trend will encourage the promotion of the skills and ideas generated by researchers in the Former Soviet Union and Eastern Europe and their incorporation in future collaborations.