Theory Of Low Temperature Plasma Physics

This book offers the reader an overview of the basic approaches to the theoretical description of low-temperature plasmas, covering numerical methods, mathematical models and modeling techniques. The main methods of calculating the cross sections of plasma particle interaction and the solution of the kinetic Boltzmann equation for determining the transport coefficients of the plasma are also presented. The results of calculations of thermodynamic properties, transport coefficients, the equilibrium particle-interaction cross sections and two-temperature plasmas are also discussed. Later chapters consider applications, and the results of simulation and calculation of plasma parameters in induction and arc plasma torches are presented. The complex physical processes in high-frequency plasmas and arc plasmas, the internal and external parameters of plasma torches, near-electrode processes, heat transfer, the flow of solid particles in plasmas and other phenomena are considered. The book is intended for professionals involved in the theoretical study of low-temperature plasmas and the design of plasma torches, and will be useful for advanced students in related areas.

This is a comprehensive textbook designed for graduate and advanced undergraduate students. Both authors rely on more than 20 years of teaching experience in renowned Physics Engineering courses to write this book addressing the students’ needs. Kinetics and Spectroscopy of Low Temperature Plasmas derives in a full self-consistent way the electron kinetic theory used to describe low temperature plasmas created in the laboratory with an electrical discharge, and presents the main optical spectroscopic diagnostics used to characterize such plasmas. The chapters with the theoretical contents make use of a deductive approach in which the electron kinetic theory applied to plasmas with basis on the electron Boltzmann equation is derived from the basic concepts of Statistical and Plasma Physics. On the other hand, the main optical spectroscopy diagnostics used to characterize experimentally such plasmas are presented and justified from the point of view of the Atomic and Molecular Physics. Low temperature plasmas (LTP) are partially ionized gases with a broad use in many technological applications such as microelectronics, light sources, lasers, biology and medicine. LTPs lead to the production of atomic and molecular excited states, chemically reactive radicals, and activated surface sites, which are in the origin, among others, of the deposition of thin films, advanced nanotechnology products, solar cells, highly efficient combustion motors, and treatment of cancer cells.

Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma have attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical and numerical techniques since the 1980s. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and the basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, vertically integrated plasma simulation schemes including surface processes. The text also shows examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.

Low-temperature plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. The authors of this volume are top scientists from the USA and Europe who present most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.

This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons. For the third edition, updates was made throughout each existing chapter, and two new chapters were added; Ch 9 on “Special Plasmas” and Ch 10 on Plasma Applications (including Atmospheric Plasmas).

Plasma science is the study of ionized states of matter. This book discusses the field's potential contributions to society and recommends actions that would optimize those contributions. It includes an assessment of the field's scientific and technological status as well as a discussion of broad themes such as fundamental plasma experiments, theoretical and computational plasma research, and plasma science education.