Ultrafast Laser Processing

Over the past few decades, the rapid development of ultrafast lasers, such as femtosecond lasers and picosecond lasers, has opened up new avenues for material processing due to their unique features such as ultrashort pulse width and extremely high peak intensity. These techniques have become a common tool for micro- and nanoprocessing of a variety

Bringing together contributions from leading experts in the field, this book reviews laser processing concepts that allow the structuring of material beyond optical limits, and methods that facilitate direct observation of the underlying mechanisms by exploring direct structuring and self-organization phenomena. The capacity to nanostructure material using ultrafast lasers lays the groundwork for the next generation of flexible and precise material processing tools. Rapid access to scales of 100 nm and below in two and three dimensions becomes a factor of paramount importance to engineer materials and to design innovative functions. To reflect the dynamic nature of the field at all levels from basic science to applications, the book is divided into three parts, Fundamental Processes, Concepts of Extreme Nanostructuring, and Applications, each of which is comprehensively covered. This book will be a useful resource for graduate students and researchers in laser processing, materials engineering, and nanoscience.

This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices.

Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This fourth edition has been revised and enlarged to cover new topics such as 3D microfabrication, advances in nanotechnology, ultrafast laser technology and laser chemical processing (LCP). Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.

Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications for metals, dielectrics, and biological tissue; advanced electronics and semiconductor processing; optical coherence tomography; multiphoton microscopy; optical sampling and scanning; THz generation and imaging; optical communication systems; absolute phase control of optical signals; and more.

Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications

Ultrafast photonics has become an interdisciplinary topic of high international research interest because of the spectacular development of compact and efficient lasers producing optical pulses with durations in the femtosecond time domain. Present day long-haul telecommunications systems are almost entirely based on the transmission of short burst

Ultrashort laser pulses with durations in the femtosecond range up to a few picoseconds provide a unique method for precise materials processing or medical applications. Paired with the recent developments in ultrashort pulse lasers, this technology is finding its way into various application fields. The book gives a comprehensive overview of the principles and applications of ultrashort pulse lasers, especially applied to medicine and production technology. Recent advances in laser technology are discussed in detail. This covers the development of reliable and cheap low power laser sources as well as high average power ultrashort pulse lasers for large scale manufacturing. The fundamentals of laser-matter-interaction as well as processing strategies and the required system technology are discussed for these laser sources with respect to precise materials processing. Finally, different applications within medicine, measurement technology or materials processing are highlighted.