Vacuum Technology Thin Films And Sputtering
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Vacuum Technology Thin Films and Sputtering
Author | : R. V. Stuart |
Publsiher | : Academic Press |
Total Pages | : 160 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 9780323139151 |
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Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee. Provides a variety of exercises in eac
Vacuum Deposition of Thin Films
Author | : L. Holland |
Publsiher | : Unknown |
Total Pages | : 608 |
Release | : 1966 |
Genre | : Vapor-plating |
ISBN | : UOM:39015003998559 |
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Thin Film Materials Technology
Author | : Kiyotaka Wasa,Makoto Kitabatake,Hideaki Adachi |
Publsiher | : William Andrew |
Total Pages | : 533 |
Release | : 2004-05-10 |
Genre | : Technology & Engineering |
ISBN | : 9780815519317 |
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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
Handbook of Sputter Deposition Technology
Author | : Kiyotaka Wasa |
Publsiher | : William Andrew |
Total Pages | : 660 |
Release | : 2012-12-31 |
Genre | : Technology & Engineering |
ISBN | : 9781437734843 |
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This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Handbook of Thin Film Process Technology
Author | : David A Glocker |
Publsiher | : CRC Press |
Total Pages | : 90 |
Release | : 2018-01-18 |
Genre | : Science |
ISBN | : 9781351081238 |
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The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
Research on Vacuum Evaporated and Cathode Sputtered Thin Films
Author | : Richard B. Belser,William E. Woolf |
Publsiher | : Unknown |
Total Pages | : 104 |
Release | : 1962 |
Genre | : Cathode sputtering (Plating process) |
ISBN | : UOM:39015095332865 |
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The Foundations of Vacuum Coating Technology
Author | : Donald M. Mattox |
Publsiher | : William Andrew |
Total Pages | : 378 |
Release | : 2018-08-21 |
Genre | : Technology & Engineering |
ISBN | : 9780128130858 |
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The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating
Thin film materials technology
Author | : Kiyotaka Wasa,Makoto Kitabatake,Hideaki Adachi |
Publsiher | : Springer Science & Business Media |
Total Pages | : 538 |
Release | : 2004-09-24 |
Genre | : Technology & Engineering |
ISBN | : 3540211187 |
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This title contains rich historical coverage of the basics and new experimental and technological information about ceramic thin film and large-area functional coating. Included are principles and examples of making thin-film materials and devices.