Auger And X Ray Photoelectron Spectroscopy In Materials Science

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.

The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.

"This book provides a theoretical background to X-ray Photoelectron Spectroscopy (XPS) and a practical guide to the analysis of the XPS spectra using the RxpsG software, a powerful tool for XPS analysis. Although there are several publications and books illustrating the theory behind X-ray Photoelectron Spectroscopy and the origin of the spectral feature, this book provides an additional practical introduction to the use of RxspG. It illustrates how to use the RxpsG software to perform specific key operations, with figures and examples which the reader can reproduce themselves. The book contains a list of theoretical sections explaining the appearance of the various spectral features (core-lines, Auger components, valence bands, loss features etc). They are accompanied by practical steps so readers can learn how to analyze specific spectral features using the various functions of the RxpsG software. This book is useful guide for researchers in physics, chemistry, and materials science who are looking to begin using X-ray Photoelectron Spectroscopy, in addition to experienced researchers who want to learn how to use RxpsG"--

Treatise on Materials Science and Technology, Volume 30: Auger Electron Spectroscopy examines Auger electron spectroscopy and its various uses, emphasizing both theoretical and experimental studies. This book discusses the historical development of auger electron spectroscopy, studies of surface segregation kinetics by auger electron spectroscopy, and local electronic structure information in auger electron spectroscopy. The metallurgical applications of auger electron spectroscopy and auger photoelectron coincidence spectroscopy are also elaborated. Other topics include the measurement of surface segregation kinetics by Auger electron spectroscopy, tempered martensite embrittlement, embrittlement of nonferrous alloys, and analysis of particle-matrix interfaces. The high-resolution scanning Auger electron spectroscopy, corrosion and stress corrosion cracking, and APECS instrumentation are likewise covered in this publication. This volume is suitable for researchers and electrical engineering students conducting work on Auger electron spectroscopy.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.