Electrochemical Processing In Ulsi And Mems 3

The papers in this issue describe the latest advances in fundamental and practical aspects of electrochemical processes for fabrication of microelectronic devices and related structures. Topics range from plating to etching, chips to packages, mechanisms to models, through-silicon vias to nanotubes, tin to ruthenium, capping to cooling, porous gold to porous alumina, probe-card springs to solder balls, electroless deposition to CMP, TFT-LCDs to magnetic nanowires and beyond.

The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Electrochemical Processing in ULSI and MEMS 4¿, held during the 215th meeting of The Electrochemical Society, in San Francisco, CA from May 24 to 29, 2009.

"Held May 2000 in Toronto, Canada, as part of the 197th meeting of the Electrochemical Society."--Pref.

For centuries, electrochemistry has played a key role in technologically important areas such as electroplating or corrosion. In recent decades, electrochemical methods are receiving increasing attention in important strongly growing fields of science and technology such as nanosciences (nanoelectrochemistry) and life-sciences (organic and biological electrochemistry). Characterization, modification and understanding of various electrochemical interfaces or electrochemical processes at the nanoscale, has led to a huge increase of the scientific interest in electrochemical mechanisms as well as of application of electrochemical methods in novel technologies. This book presents exciting emerging scientific and technological aspects of the introduction of the nanodimension in electrochemical approaches are presented in 12 chapters/subchapters.

The definitive resource for electroplating, now completely up to date With advances in information-age technologies, the field of electroplating has seen dramatic growth in the decade since the previous edition of Modern Electroplating was published. This expanded new edition addresses these developments, providing a comprehensive, one-stop reference to the latest methods and applications of electroplating of metals, alloys, semiconductors, and conductive polymers. With special emphasis on electroplating and electrochemical plating in nanotechnologies, data storage, and medical applications, the Fifth Edition boasts vast amounts of new and revised material, unmatched in breadth and depth by any other book on the subject. It includes: Easily accessible, self-contained contributions by over thirty experts Five completely new chapters and hundreds of additional pages A cutting-edge look at applications in nanoelectronics Coverage of the formation of nanoclusters and quantum dots using scanning tunneling microscopy (STM) An important discussion of the physical properties of metal thin films Chapters devoted to methods, tools, control, and environmental issues And much more A must-have for anyone in electroplating, including technicians, platers, plating researchers, and metal finishers, Modern Electroplating, Fifth Edition is also an excellent reference for electrical engineers and researchers in the automotive, data storage, and medical industries.