Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. Martin
Publsiher: William Andrew
Total Pages: 936
Release: 2009-12-01
Genre: Technology & Engineering
ISBN: 9780815520320

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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author: Rointan Framroze Bunshah
Publsiher: William Andrew
Total Pages: 888
Release: 1994
Genre: Technology & Engineering
ISBN: 9780815513377

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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Handbook of Thin Film Technology

Handbook of Thin Film Technology
Author: Hartmut Frey,Hamid R. Khan
Publsiher: Springer Science & Business Media
Total Pages: 380
Release: 2015-05-06
Genre: Technology & Engineering
ISBN: 9783642054303

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“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Handbook of Physical Vapor Deposition PVD Processing

Handbook of Physical Vapor Deposition  PVD  Processing
Author: D. M. Mattox
Publsiher: Cambridge University Press
Total Pages: 947
Release: 2014-09-19
Genre: Technology & Engineering
ISBN: 9780080946580

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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Deposition Technologies for Films and Coatings

Deposition Technologies for Films and Coatings
Author: Rointan Framroze Bunshah
Publsiher: William Andrew
Total Pages: 620
Release: 1982
Genre: Coating processes
ISBN: UOM:39015000997372

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Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author: Rointan F. Bunshah
Publsiher: William Andrew
Total Pages: 887
Release: 1994-12-31
Genre: Science
ISBN: 9780815517467

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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Handbook of Thin film Deposition Processes and Techniques

Handbook of Thin film Deposition Processes and Techniques
Author: Krishna Seshan
Publsiher: Unknown
Total Pages: 629
Release: 2002
Genre: Chemical vapor deposition
ISBN: 6612253193

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The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology
Author: Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
Publsiher: William Andrew
Total Pages: 658
Release: 2012-11-20
Genre: Science
ISBN: 9781437734836

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Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.