Ion Beams In Materials Processing And Analysis

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.

Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

The Handbook of Modern Ion Beam Materials Analysis is a compilation of updated techniques and data for use in the ion-beam analysis of materials. The information presented is unavailable collectively from any other source, and places a strong emphasis on practical examples of the analysis techniques as they are applied to common problems. The book's 13 chapters cover discussions and examples, while 18 appendices provide extensive compilations of relevant data. Numerous techniques are discussed, including elastic recoil detection and activation analysis. Material in the book pushes the boundaries of ion-beam analysis to higher energies. The detection of light elements is emphasized, and background materials in the areas of energy loss, nuclear theory, instrumentation, analysis pitfalls and radiation safety are also provided for a better understanding of the principles basic to the techniques.

The II. International Conference on Ion Beam Surface Layer Analysis was held on September 15-19, 1975 at the Nuclear Research Center, Karlsruhe, Germany. The date fell between two related con ferences: "Application of Ion-Beams to Materials" at Warwick, Eng land and "Atomic Collisions in Solids" at Amsterdam, the Nether lands. The first conference on Ion Beam Surface Layer Analysis was held at Yorktown Heights, New York, 1973. The major topic of that and the present conference was the material analysis with ion beams including backscattering and channeling, nuclear reactions and ion induced X-rays with emphasis on technical problems and no vel applications. The increasing interest in this field was docu mented by 7 invited papers and 85 contributions which were presen ted at the meeting in Karlsruhe to about 150 participants from 21 countries. The oral presentations were followed by parallel ses sions on "Fundamental Aspects", "Analytical Problems" and "Appli cations" encouraging detailed discussions on the topics of most current interest. Summaries of these sessions were presented by the discussion leaders to the whole conference. All invited and contributed papers are included in these proceedings; summaries of the discussion sessions will appear in a separate booklet and are availble from the editors. The application of ion beams to material analysis is now well established.

Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. Examines classical collision theory Details the fundamentals of five specific ion beam analysis techniques Illustrates specific applications, including biomedicine and thin film analysis Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.

The Handbook of Modern Ion Beam Materials Analysis, 2nd Edition is a compilation of updated techniques and data for use in the ion-beam analysis of materials. The information presented is unavailable collectively from any other source, and places a strong emphasis on practical examples of the analysis techniques as they are applied to common problems. Revised and updated from the popular handbook previously released in 1995, this edition is written and compiled by over 30 leading authorities in the field of ion beam analysis. It provides an excellent introduction to the fundamentals and lab practices of ion beam analysis and is also useful as a teaching text for undergraduate senior or first-year graduate students This text is a comprehensive collection of nuclear and atomic data for the applications of ion beam materials analysis. In addition, the DVD includes bonus info - both the Ion Beam Analysis Nuclear Data Library (IBANDL) and GUPIX Subroutines (CSA and YLS) for X-ray Database.