Physics Fabrication And Applications Of Multilayered Structures

Low-dimensional materials are of fundamental interest in physics and chemistry and have also found a wide variety of technological applica tions in fields ranging from microelectronics to optics. Since 1986, several seminars and summer schools devoted to low-dimensional systems have been supported by NATO. The present one, Physics, Fabrication and Applications of Multilayered structures, brought together specialists from different fields in order to review fabrication techniques, charac terization methods, physics and applications. Artificially layered materials are attractive because alternately layering two (or more) elements, by evaporation or sputtering, is a way to obtain new materials with (hopefully) new physical properties that pure materials or alloys do not allow. These new possibilities can be ob tained in electronic transport, optics, magnetism or the reflectivity of x-rays and slow neutrons. By changing the components and the thickness of the layers one can track continuously how the new properties appear and follow the importance of the multilayer structure of the materials. In addition, with their large number of interfaces the study of inter face properties becomes easier in multilayered structures than in mono layers or bilayers. As a rule, the role of the interface quality, and also the coupling between layers, increases as the thickness of the layer decreases. Several applications at the development stage require layer thicknesses of just a few atomic layers.

Electron Microscopy and Analysis 1997 celebrates the centenary anniversary of the discovery of the electron by J.J. Thomson in Cambridge and the fiftieth anniversary of this distinguished Institute group. The book includes papers on the early history of electron microscopy (from P. Hawkes), the development of the scanning electron microscope at Cambridge (from K. Smith), electron energy loss spectroscopy (from L.M. Brown), imaging methods (from J. Spence), and the future of electron microscopy (from C. Humphreys). Covering a wide range of applications of advanced techniques, it discusses electron imaging, electron energy-loss and x-ray analysis, and scanning probe and electron beam microscopies. This volume is a handy reference for professionals using microscopes in all areas of physics, materials science, metallurgy, and surface science to gain an overview of developments in our understanding of materials microstructure and of advances in microscope interrogation techniques.

Electron Microscopy and Analysis 1997 celebrates the centenary anniversary of the discovery of the electron by J.J. Thomson in Cambridge and the fiftieth anniversary of this distinguished Institute group. The book includes papers on the early history of electron microscopy (from P. Hawkes), the development of the scanning electron microscope at Cambridge (from K. Smith), electron energy loss spectroscopy (from L.M. Brown), imaging methods (from J. Spence), and the future of electron microscopy (from C. Humphreys). Covering a wide range of applications of advanced techniques, it discusses electron imaging, electron energy-loss and x-ray analysis, and scanning probe and electron beam microscopies. This volume is a handy reference for professionals using microscopes in all areas of physics, materials science, metallurgy, and surface science to gain an overview of developments in our understanding of materials microstructure and of advances in microscope interrogation techniques.

This text is a first attempt to pull together the whole of semiconductor science and technology since 1970 in so far as semiconductor multilayers are concerned. Material, technology, physics and device issues are described with approximately equal emphasis, and form a single coherant point of view. The subject matter is the concern of over half of today's active semiconductor scientists and technologists, the remainder working on bulk semiconductors and devices. It is now routine to design and the prepare semiconductor multilayers at a time, with independent control over the dropping and composition in each layer. In turn these multilayers can be patterned with features that as a small as a few atomic layers in lateral extent. The resulting structures open up many new ares of exciting solid state and quantum physics. They have also led to whole new generations of electronic and optoelectronic devices whose superior performance relates back to the multilayer structures. The principles established in the field have several decades to go, advancing towards the ultimate of materials engineering, the design and preparation of solids atom by atom. The book should appeal equally to physicists, electronic engineers and materials scientists.

X-Ray Lasers 1996 provides not only an overview and progress report on this fast moving field, but also important reference material on which future work can be built. Topics covered include collisional x-ray lasers, table-top x-ray lasers, beam optics, x-ray optics, OFI and photo-pumped schemes, capillary schemes, international laser facilities, XUV nonlinear mixing, alternative soft x-ray sources, diagnostics, and applications. The volume is an essential addition to the libraries of researchers in the field.

Mechanic and Dielectric Properties deals with the mechanical and dielectric properties of thin films. Topics covered range from the deposition and mechanical properties of superlattice thin films to the preparation of hard coatings by sputtering and arc evaporation. The use of thin films in microwave acoustics is also discussed, along with ferroelectric films for integrated electronics and the physics, chemistry, and technology of electrochromic tungsten-oxide-based thin films. Comprised of five chapters, this volume begins with an analysis of the growth, characterization, and mechanical behavior of films comprising multilayers primarily of metal and refractory metallic compound components. The next chapter reviews the mechanical properties of hard coatings prepared by sputtering and arc evaporation, together with the influence of multilayer and gradient structures, and of film crystallinity, crystal orientation, and morphology, on properties such as hardness, coating smoothness, and friction behavior. Subsequent chapters focus on the unique role played by piezoelectric films in signal processing devices utilizing bulk or surface acoustic waves; the properties and applications of ferroelectric films in integrated electronics; and the underlying physics and chemistry of electrochromic tungsten-oxide-based thin films. This book should be of interest to physicists.

Quantum Wells, Wires and Dots provides all the essential information, both theoretical and computational, to develop an understanding of the electronic, optical and transport properties of these semiconductor nanostructures. The book will lead the reader through comprehensive explanations and mathematical derivations to the point where they can design semiconductor nanostructures with the required electronic and optical properties for exploitation in these technologies. This fully revised and updated 4th edition features new sections that incorporate modern techniques and extensive new material including: Properties of non-parabolic energy bands Matrix solutions of the Poisson and Schrödinger equations Critical thickness of strained materials Carrier scattering by interface roughness, alloy disorder and impurities Density matrix transport modelling Thermal modelling Written by well-known authors in the field of semiconductor nanostructures and quantum optoelectronics, this user-friendly guide is presented in a lucid style with easy to follow steps, illustrative examples and questions and computational problems in each chapter to help the reader build solid foundations of understanding to a level where they can initiate their own theoretical investigations. Suitable for postgraduate students of semiconductor and condensed matter physics, the book is essential to all those researching in academic and industrial laboratories worldwide. Instructors can contact the authors directly ([email protected] / [email protected]) for Solutions to the problems.

This book, a collection of works by leading figures in the field, is devoted to the latest developments of modern magnetism including micromagnetism, nanomagnetic materials, magnetic multilayers, macroscopic quantum magnetism, rare-earth intermetallic compounds, giant magnetoresistance, and their applications. Some new concepts and theories are also included for a better understanding of these novel phenomena.This book can be used as an advanced text book on magnetism and materials science for graduate students in physics and materials science departments. It is also useful as a research reference for condensed matter physicists and materials scientists.