Semiconductor Process Integration 10
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Semiconductor Process Integration 10
Author | : J. Murota,C. L. Claeys,H. Iwai,M. Tao,S. Deleonibus,A. Mai,K. Shiojima,P. Chin |
Publsiher | : The Electrochemical Society |
Total Pages | : 325 |
Release | : 2024 |
Genre | : Electronic Book |
ISBN | : 9781607688211 |
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Handbook of Semiconductor Manufacturing Technology
Author | : Yoshio Nishi,Robert Doering |
Publsiher | : CRC Press |
Total Pages | : 1720 |
Release | : 2017-12-19 |
Genre | : Technology & Engineering |
ISBN | : 9781420017663 |
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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Recent Topics on Modeling of Semiconductor Processes Devices and Circuits
Author | : Rasit Onur Topaloglu,Peng Li |
Publsiher | : Bentham Science Publishers |
Total Pages | : 200 |
Release | : 2011-09-09 |
Genre | : Technology & Engineering |
ISBN | : 9781608050741 |
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"The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Predictive Simulation of Semiconductor Processing
Author | : Jarek Dabrowski,Eicke R. Weber |
Publsiher | : Springer Science & Business Media |
Total Pages | : 505 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 9783662094327 |
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Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
Fluoroplastics Volume 2
Author | : Sina Ebnesajjad |
Publsiher | : William Andrew |
Total Pages | : 766 |
Release | : 2015-07-30 |
Genre | : Technology & Engineering |
ISBN | : 9781455731985 |
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Fluoroplastics, Volume 2: Melt Processible Fluoropolymers - The Definitive User's Guide and Data Book compiles the working knowledge of the polymer chemistry and physics of melt processible fluoropolymers with detailed descriptions of commercial processing methods, material properties, fabrication and handling information, technologies, and applications, also including history, market statistics, and safety and recycling aspects. Both volumes of Fluoroplastics contain a large amount of specific property data useful for users to readily compare different materials and align material structure with end use applications. Volume Two concentrates on melt-processible fluoropolymers used across a broad range of industries, including automotive, aerospace, electronic, food, beverage, oil/gas, and medical devices. This new edition is a thoroughly updated and significantly expanded revision covering new technologies and applications, and addressing the changes that have taken place in the fluoropolymer markets. Exceptionally broad and comprehensive coverage of melt processible fluoropolymers processing and applications Provides a practical approach, written by long-standing authorities in the fluoropolymers industry Thoroughly updated and significantly expanded revision covering new technologies and applications, and addressing the changes that have taken place in the fluoropolymer markets
ULSI Process Integration III
Author | : Electrochemical Society. Meeting |
Publsiher | : The Electrochemical Society |
Total Pages | : 620 |
Release | : 2003 |
Genre | : Technology & Engineering |
ISBN | : 1566773768 |
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Silicon Devices and Process Integration
Author | : Badih El-Kareh |
Publsiher | : Springer Science & Business Media |
Total Pages | : 614 |
Release | : 2009-01-09 |
Genre | : Technology & Engineering |
ISBN | : 9780387690100 |
Download Silicon Devices and Process Integration Book in PDF, Epub and Kindle
Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author’s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration. This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.
ULSI Process Integration 6
Author | : C. Claeys |
Publsiher | : The Electrochemical Society |
Total Pages | : 547 |
Release | : 2009-09 |
Genre | : Integrated circuits |
ISBN | : 9781566777445 |
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ULSI Process Integration 6 covers all aspects of process integration. Sections are devoted to 1) Device Technologies, 2) Front-end-of-line integration (gate stacks, shallow junctions, dry etching, etc.), 3) Back-end-of-line integration (CMP, low-k, Cu interconnect, air-gaps, 3D packaging, etc.), 4) Alternative channel technologies (Ge, III-V, hybrid integration), and 5) Emerging technologies (CNT, graphene, polymer electronics, nanotubes).