X Ray Photoelectron Spectroscopy

This book introduces readers interested in the field of X-ray Photoelectron Spectroscopy (XPS) to the practical concepts in this field. The book first introduces the reader to the language and concepts used in this field and then demonstrates how these concepts are applied. Including how the spectra are produced, factors that can influence the spectra (all initial and final state effects are discussed), how to derive speciation, volume analysed and how one controls this (includes depth profiling), and quantification along with background substraction and curve fitting methodologies. This is presented in a concise yet comprehensive manner and each section is prepared such that they can be read independently of each other, and all equations are presented using the most commonly used units. Greater emphasis has been placed on spectral understanding/interpretation. For completeness sake, a description of commonly used instrumentation is also presented. Finally, some complementary surface analytical techniques and associated concepts are reviewed for comparative purposes in stand-alone appendix sections.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Modern ESCA: The Principles and Practice of X-Ray Photoelectron Spectroscopy is a unique text/reference that focuses on the branch of electron spectroscopy generally labeled as either Electron Spectroscopy for Chemical Analysis (ESCA) or X-ray Photoelectron Spectroscopy (XPS). The book emphasizes the use of core level and valence band binding energies, their shifts, and line widths. It describes the background, present status, and possible future uses of a number of recently developed branches of ESCA, including:

Photoemission (also known as photoelectron) spectroscopy refers to the process in which an electron is removed from a specimen after the atomic absorption of a photon. The first evidence of this phenomenon dates back to 1887 but it was not until 1905 that Einstein offered an explanation of this effect, which is now referred to as ""the photoelectric effect"". Quantitative Core Level Photoelectron Spectroscopy: A Primer tackles the pragmatic aspects of the photoemission process with the aim of introducing the reader to the concepts and instrumentation that emerge from an experimental approach. The basic elements implemented for the technique are discussed and the geometry of the instrumentation is explained. The book covers each of the features that have been observed in the X-ray photoemission spectra and provides the tools necessary for their understanding and correct identification. Charging effects are covered in the penultimate chapter with the final chapter bringing closure to the basic uses of the X-ray photoemission process, as well as guiding the reader through some of the most popular applications used in current research.

The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.