Trace Analysis Of Semiconductor Materials

Trace Analysis of Semiconductor Materials is a guidebook concerned with procedures of ultra-trace analysis. This book discusses six distinct techniques of trace analysis. These techniques are the most common and can be applied to various problems compared to other methods. Each of the four chapters basically includes an introduction to the principles and general statements. The theoretical basis for the technique involved is then briefly discussed. Practical applications of the techniques and the different instrumentations are explained. Then, the applications to trace analysis as pertaining to semiconductor materials are discussed. Chapter 1 discusses radiochemical practice, the analysis of semiconductor materials, separation techniques, several qualitative radiochemical schemes, radiochemical purification procedures, and several earlier reported studies. Chapter 2 covers emission spectroscopy, including its potential for future applications. Discussions in Chapter 3 explain the benefits of each of the four mass spectrometric methods, namely, the isotope dilution method, complete thermal vaporization, vacuum spark technique, and the ion bombardment method. Chapter 4 focuses on the absorption, fluorescence, and polarographic methods used in general trace analysis, including examples of semiconductor material applications and other problems that result when certain impurities are introduced into the test sample. This monograph will be useful for researchers in ultra-trace analysis, nuclear physics, and analytical chemistry.

There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.

.".. ALTECH 2003 was Symposium J1 held at the 203rd Meeting of the Electrochemical Society in Paris, France from April 27 to May 2, 2003 ... Symposium M1, Diagnostic Techniques for Semiconductor Materials and Devices, was part of the 202nd Meeting of the Electrochemical Society held in Salt Lake City, Utah, from October 21 to 25, 2002 ..."--p. iii.

Explores the latest advances and applications of specialty and electronic gas analysis The semiconductor industry depends upon a broad range of instrumental techniques in order to detect and analyze impurities that may be present in specialty and electronic gases, including permanent gases, water vapor, reaction by-products, and metal species. Trace Analysis of Specialty and Electronic Gases draws together all the latest advances in analytical chemistry, providing researchers with both the theory and the operating principles of the full spectrum of instrumental techniques available for specialty and electronic gas analysis. Moreover, the book details the advantages and disadvantages of each technique, steering readers away from common pitfalls. Featuring contributions from leading analytical and industrial chemists, Trace Analysis of Specialty and Electronic Gases covers a wide range of practical industrial applications. The book begins with the historical development of gas analysis and then focuses on particular subjects or techniques such as: Metals sampling and ICP-MS analysis Improvements in FTIR spectroscopy Water vapor analysis techniques New infrared laser absorption spectroscopy approaches GC/MS, GC/AED, and GC-ICP-MS techniques Gas chromatography columns Atmospheric pressure ionization mass spectrometry Lastly, the book examines gas mixtures and standards that are critical for instrument calibration. There are also two appendices offering information on fittings and material compatibility. With its thorough review of the literature and step-by-step guidance, Trace Analysis of Specialty and Electronic Gases enables researchers to take full advantage of the latest advances in gas analysis. Although the book's focus is the semiconductor and electronics industry, analytical chemists in other industries facing challenges with such issues as detection selectivity and sensitivity, matrix gas interference, and materials compatibility will also discover plenty of useful analytical approaches and techniques.

The 11th Colloquium on Metallurgical Analysis - a joint venture of the Institute of Analytical Chemistry of the Technical University in Vienna, the Austrian Society for Analytical Chemistry and Microchemistry, the German Metals Society (DGM), and the Society of German Iron and Steel Engineers (VDEh) - was attended by 120 scientists from 12 nations. The major topics covered were surface, micro and trace analysis of materials with a heavy emphasis on metals. According to the strategy of the meeting attention was focussed on an interdisciplinary approach to materials science - combining analytical chemistry, solid state physics and tech nology. Therefore progress reports on analytical techniques (like SIMS, SNMS, Positron Annihilation Spectroscopy, AES, XPS) were given as well as pre sentations on the development of materials (like for the fusion reactor). The majority of the discussion papers centered on the treatment of important technical problems in materials science and technology by a (mostly sophis ticated) combination of physical and chemical analytical techniques. The intensive exchange of ideas and results between the scientists oriented towards basic research and the industrial materials technologists was very fruitful and resulted in the establishment of several scientific cooperations. Major trends in materials analysis were also dealt with in a plenary discussion of which a short summary is contained in this volume. In order to facilitate international communication in the field of materials analysis and in view of the important questions treated in the various contri butions this proceedings volume was edited in English.

Applied Gamma-Ray Spectrometry covers real life application of the gamma-ray and the devices used in their experimental studies. This book is organized into 9 chapters, and starts with discussions of the various decay processes, the possible interaction mechanisms of gamma radiation with matter, and the intrinsic and extrinsic variables, which affect the observed gamma-ray and X-ray spectra. The subsequent chapters deal with the properties and fabrication of scintillation detectors, semiconductor detectors, and proportional gas counters. These chapters present some of the most widely utilized applications of these detectors, with a particular emphasis to the activation analysis. These topics are followed by reviews of the description of basic equipment, such as amplifiers, analyzers, special spectrometer arrangements, and detector shielding. Other chapters describe energy and time resolution and quantitative calibration. The quantitative and qualitative interpretation of the spectra is also explained, along with the calibration of the detectors. The last chapter considers the analytical applications of gamma-ray and X-ray spectrometry in tracer studies, activation analysis, fission product studies, and X-ray fluorescence analysis. This book will be of value to analytical chemists and analytical chemistry researchers.